Semiconductor Cell Layout Grouping for Compatible Standard Cells
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Solution Overview
Problem
Current semiconductor manufacturing methods face inefficiencies in designing integrated circuits due to restrictions on pre-designed standard cell layouts, leading to increased time and complexity in finding compatible cell units and lengthy signal paths.
Innovation Solution
The method involves defining multiple cell level groups with specific pattern features corresponding to different stages of the manufacturing process, allowing for the determination of compatible cell units with identical or interchangeable pattern features, reducing the need for multiple libraries and optimizing layout design.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If pre-designed layouts of standard cells are retrieved from cell libraries and placed into desired locations, then the design process is standardized and efficient, but the layouts are restricted by predetermined functions and cannot be freely customized
Solution Approach 1:
The standard cell layout is divided into multiple selectable patterns that can be independently chosen and combined. Each pattern represents a modular unit that can be selected based on specific design requirements, allowing customization while maintaining standardization benefits.
Solution Approach 2:
The layout selection process is made dynamic by allowing designers to choose from multiple patterns based on real-time design requirements. The system transitions from static predetermined layouts to dynamic selectable patterns that adapt to specific circuit design needs.
2Adaptability or versatility
If multiple cell level groups with different pattern features are defined, then the manufacturing process becomes more flexible and adaptable, but the device complexity and process steps increase
Solution Approach 1:
The manufacturing process is segmented into distinct cell level groups, each handling specific pattern features. This segmentation allows complex manufacturing to be broken down into manageable, standardized stages that can be independently optimized and executed.
Solution Approach 2:
Different cell level groups are defined in advance, with each group pre-configured for specific pattern features. This preliminary organization of manufacturing steps reduces on-the-fly decision complexity and enables systematic processing of different layout patterns.
Data Source
AI summary
A method for semiconductor manufacturing is provided. The method includes defining a first cell level group comprising a first set of pattern features corresponding to a predetermined manufacturing process associated with an layout; determining a first number of cell units based on the first cell level group, wherein each of the first number of cell units is compatible with each other; defining a second cell level group comprising the first set of pattern features and a second set of pattern features; and determining a second number of cell units based on the second cell level group, wherein each of the second number of cell units is compatible with each other. The first set of pattern features and the second set of pattern features are arranged in responsive to sequential operations of the predetermined manufacturing process.