Semiconductor Chamber Cleaning Head for Quasi-Sealed Robotic Scrubbing

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Solution Overview

Problem

The manual cleaning of semiconductor processing chambers is labor-intensive, time-consuming, and poses safety risks to personnel, while inadequate cleaning leads to contamination and reduced equipment uptime.

Innovation Solution

A quasi-sealed cleaning apparatus equipped with a robot and a cleaning head that autonomously cleans the processing chamber walls, venting or collecting toxic waste through isolated channels, and using a scrubbing mechanism to remove residues.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If manual cleaning is performed, then cleaning can be done, but it is labor-intensive and time-consuming

Engineering Contradiction:
Improvecleaning efficiencyVSAvoidcleaning time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The cleaning system performs cleaning operations autonomously without continuous human intervention. The robot navigates the chamber independently, positions cleaning heads, and executes cleaning cycles automatically, allowing the system to service itself and eliminating the need for manual labor while maintaining high cleaning efficiency

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

Manual mechanical cleaning operations are replaced with an automated robotic system that uses programmed mechanical movements, automated positioning systems, and controlled cleaning mechanisms to perform all cleaning tasks, thereby eliminating labor-intensive manual operations and reducing cleaning time

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Reliability

If manual cleaning is performed, then cleaning can be done, but safety risks to personnel arise

Engineering Contradiction:
Improvecleaning qualityVSAvoidsafety risks
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

Human operators are extracted from the cleaning process entirely. The hazardous cleaning environment, which includes exposure to toxic residues and confined space risks, is removed from human involvement by transferring all cleaning operations to an autonomous robotic system, thereby eliminating safety risks while maintaining cleaning quality through programmed precision

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The robotic system acts as an intermediary between the cleaning objectives and the hazardous environment. Instead of humans directly interacting with toxic residues and confined spaces, the robot serves as a mediator that performs all cleaning operations remotely and autonomously, protecting personnel while ensuring reliable cleaning through automated control

Inventive Principle:
Principle #24Intermediary (Mediator)

3Loss of time

If cleaning is inadequate, then less cleaning time is needed, but contamination and reduced equipment uptime occur

Engineering Contradiction:
Improvecleaning timeVSAvoidequipment uptime
Core Design Contradiction:
Loss of timeVSReliability

Solution Approach 1:

The automated cleaning system operates continuously and systematically throughout the entire chamber, ensuring no areas are missed. The robot continuously navigates and cleans all surfaces methodically, providing complete coverage and eliminating the risk of inadequate cleaning that would lead to contamination and equipment downtime

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The cleaning system incorporates sensors and detection mechanisms that provide real-time feedback on cleaning progress and quality. This feedback allows the system to verify thorough cleaning, adjust operations as needed, and ensure that all areas meet cleanliness standards before completing the cycle, thereby preventing contamination while maintaining efficient operation

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS12472538B2Apparatus for cleaning semiconductor equipment
Publication Date: 2025.11.18 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12472538B2 patent drawing
  • US12472538B2 patent drawing
  • US12472538B2 patent drawing

AI summary

An apparatus includes a casing configured to be detachably mounted on a workpiece. The casing includes a first opening configured to expose a portion of the workpiece; a first support member coupled to the casing and constructed to move along a first axis through the casing and rotate around the first axis; a second support member coupled to the first support member and constructed to move along a second axis perpendicular to the first axis; an arm pivotally coupled to the second support member and constructed to rotate around a third axis perpendicular to the first axis and the second axis; and a cleaning head attached to the arm and constructed to rotate around a longitudinal axis of the arm. The casing includes a first plate and a second plate opposite to the first plate, wherein the cleaning head is configured to extend outside the casing through the first opening.