Semiconductor Coil Structure for Induced Current Measurement
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Solution Overview
Problem
The semiconductor manufacturing process faces challenges in precise control of element formation as the industry advances to smaller technology nodes, requiring improved methods for forming conductive structures and measuring induced currents in semiconductor devices.
Innovation Solution
A method involving the formation of a conductive coil in an interconnection structure, followed by a passivation layer, conductive layer deposition, and reduction, patterning to form conductive materials with controlled thickness, and oxide layer formation to measure induced currents, ensuring precise electrical connections and measurements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional manufacturing methods are used for forming conductive structures, then the manufacturing process is simpler, but the manufacturing precision deteriorates as technology nodes shrink
Solution Approach 1:
The patent divides the manufacturing process into distinct sequential stages: forming the conductive coil in the interconnection structure, depositing the passivation layer, forming the conductive layer with patterned openings, and creating the oxide layer. Each stage is independently controlled and measured, enabling precise manufacturing at advanced technology nodes while maintaining process manageability through clear segmentation of operations.
2Measurement precision
If direct measurement methods are used for conductivity, then the measurement process is simpler, but the measurement precision deteriorates due to oxide layer interference
Solution Approach 1:
The patent introduces an intermediary measurement approach where the conductive coil serves as a mediator to indirectly measure the conductivity of the conductive terminal. By measuring the induced current in the conductive coil rather than directly measuring the conductive terminal, the system achieves accurate conductivity measurement while avoiding the interference caused by oxide layers on the terminal surface.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise control of conductive structures and effective measurement of induced currents, enhancing the manufacturing process for advanced semiconductor devices.
Implementation Method 1
An induced current generated in the conductive coil by the Eddy currents can be detected and measured
Implementation Method 2
An induced current generated in the conductive coil by the Eddy currents can be detected and measured
Data Source
AI summary
A semiconductor structure is provided. The semiconductor structure includes an interconnection structure, a first conductive pad, a second conductive pad, a conductive material and a conductive coil. The first and second conductive pads are disposed over and electrically connected to the interconnection structure individually. The conductive material is electrically isolated from the interconnection structure, wherein bottom surfaces of the conductive material, the first conductive pad and the second conductive pad are substantially aligned. The conductive coil is disposed in the interconnection structure and overlapped by the conductive material. A manufacturing method of a semiconductor structure is also provided.