Semiconductor Processing Composition for Storage-Stable Resist Removal
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Solution Overview
Problem
Existing semiconductor processing compositions suffer from storage stability issues due to chemical reactions caused by heating or long-term storage, leading to deterioration of processing characteristics and reduced manufacturing yield.
Innovation Solution
A composition comprising specific compounds in defined ratios, including those represented by general formulas (1) and (2), along with functional groups and a liquid medium, maintains stability and processing characteristics even after storage, enhancing manufacturing yield.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the composition is heated to 50°C to 65°C immediately before use to efficiently remove resist film or residue, then processing efficiency is improved, but storage stability deteriorates due to chemical reactions caused by heating or long-term storage
Solution Approach 1:
The composition is divided into multiple components with specific functions: compound (A) as the main active ingredient, compound (B) as a stabilizing agent, compound (C) with specific functional groups, and liquid medium (D). This segmentation allows each component to contribute to either processing efficiency or storage stability, resolving the contradiction between heating for efficiency and storage stability.
Solution Approach 2:
The patent specifies precise parameter ranges including the ratio MA/MB of 1.0×10² to 1.0×10⁴, pH range of 2.0 to 12.0, and temperature range of 25°C to 65°C for use. By controlling these parameters, the composition maintains storage stability while allowing efficient processing when heated, thus resolving the contradiction between storage stability and processing efficiency.
2Stability of the object's composition
If the composition is stored at near room temperature for long-term storage, then storage stability is maintained, but processing characteristics deteriorate due to chemical reactions during storage
Solution Approach 1:
Compound (B) acts as an intermediary or stabilizing agent that prevents harmful chemical reactions between compound (A) and other components during storage. This intermediary substance allows the composition to be stored at room temperature without deteriorating processing characteristics, resolving the contradiction between storage stability and processing reliability.
Solution Approach 2:
The composition is formulated as a composite material containing multiple compounds (A), (B), and (C) with specific functional groups in defined ratios. This composite structure provides both storage stability and reliable processing characteristics, as each component contributes specific properties that complement each other and prevent degradation during storage.
3Productivity
If the composition contains multiple chemical substances for effective processing, then processing capability is improved, but storage stability deteriorates due to chemical reactions between components
Solution Approach 1:
The patent specifies precise parameter ranges including the ratio MA/MB of 1.0×10² to 1.0×10⁴, pH range of 2.0 to 12.0, and temperature range of 25°C to 65°C for use. By controlling these parameters, the composition maintains storage stability while allowing efficient processing when heated, thus resolving the contradiction between storage stability and processing efficiency.
Data Source
AI summary
A composition for semiconductor processing according to the disclosure contains (A) a compound represented by the following general formula (1), (B) a compound represented by the following general formula (2), (C) a compound having at least one functional group selected from the group consisting of an amino group and a salt thereof and a hydroxyl group (excluding the compound represented by the following general formula (1), a compound having a carboxyl group and a nitrogen-containing heterocyclic compound) and (D) a liquid medium, and, when the content of the (A) component is indicated by MA [mass %] and the content of the (B) component is indicated by MB [mass %], MA/MB is 1.0×102 to 1.0×104.R2N(OH) (1)R2NH (2)(In the formula (1) and the formula (2), R's each independently represent an alkyl group having 1 to 4 carbon atoms).