Semiconductor Defect Detection via Frequency Domain Filtering

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Solution Overview

Problem

Existing methods for detecting defects in semiconductor patterns require large storage spaces and precise image alignment, and are prone to errors due to color differences and alignment issues when comparing multiple images.

Innovation Solution

A method involving a Fourier transform and low-pass filtering of images to transform and filter them into a frequency domain, allowing for defect detection by comparing the filtered images with a reference image without the need for precise alignment, using relation values between pixel grey levels to determine defect existence and positions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If multiple adjacent images are compared to detect defects, then defect detection capability is improved, but storage space requirements increase

Engineering Contradiction:
Improvedefect detection capabilityVSAvoidstorage space
Core Design Contradiction:
Measurement precisionVSQuantity of substance

Solution Approach 1:

The patent extracts only the essential defect information from images by transforming to frequency domain and applying low-pass filtering. This removes redundant high-frequency data while preserving defect characteristics, allowing effective defect detection with reduced storage requirements for image data

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent changes the representation parameters of images by transforming from spatial domain to frequency domain. This parameter transformation allows the system to work with transformed image data that requires less storage while maintaining defect detection capability through frequency domain analysis

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If multiple images with different colors are compared, then defect detection is performed, but color differences cause detection errors

Engineering Contradiction:
Improvedefect detectionVSAvoiddetection accuracy
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent applies low-pass filtering in the frequency domain to remove high-frequency color variations while preserving the structural defect information. This parameter filtering approach changes the image representation to emphasize structural features over color differences, improving detection reliability

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The frequency domain transformation acts as an intermediary that separates structural defect information from color variation information. By working in this intermediate representation space, the system can compare images while ignoring color differences that would otherwise cause false detections

Inventive Principle:
Principle #24Intermediary (Mediator)

3Measurement precision

If precise alignment between images is performed, then defect detection precision is improved, but alignment complexity and time increase

Engineering Contradiction:
Improvedefect detection precisionVSAvoidalignment complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent transforms images to frequency domain where periodic patterns appear as distinct frequency components. This parameter transformation makes the images inherently more robust to misalignment, reducing the complexity of alignment operations while maintaining detection precision

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent performs low-pass filtering as a preliminary action before defect comparison. This preprocessing step smooths out minor misalignments and reduces the sensitivity to alignment errors, allowing simpler alignment procedures while maintaining detection accuracy

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS8126258B2Method of detecting defects in patterns on semiconductor substrate by comparing second image with reference image after acquiring second image from first image and apparatus for performing the same
Publication Date: 2012.02.28 SAMSUNG ELECTRONICS CO LTD
  • US8126258B2 patent drawing
  • US8126258B2 patent drawing
  • US8126258B2 patent drawing

AI summary

In a method of detecting defects in patterns and an apparatus for performing the method, a first image of a detection region on a semiconductor substrate may be acquired. A second image may be acquired from the first image by performing a Fourier transform and performing a low pass filtering. The second image may be compared with a reference image so that the defects of the detection region are detected. Existence of the defect of the second image is determined using a relation value between a grey level of each of pixels of the second image and the reference image, respectively. When a defect exists, the horizontal and the vertical positions of the pixel where the relation value is minimum are combined to determine the position of the defect.