Closed Chamber Semiconductor Drying with Condensation
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Solution Overview
Problem
Existing methods for drying semiconductor articles in the production process are inefficient and prone to contamination from external air or gases, which compromises the cleanliness and introduces foreign particles.
Innovation Solution
A closed treatment chamber system that circulates and dries gas using a condensation dryer, eliminating external contamination and utilizing a heat exchanger and condenser plates for efficient moisture removal, with optional external coolant supply.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If outside air is directed into the treatment chamber via a filter for drying, then the drying function is achieved, but foreign particles are introduced into the treatment chamber
Solution Approach 1:
The patent uses a closed treatment chamber that maintains an inert or controlled atmosphere during the drying process. Instead of introducing outside air, the system recirculates and conditions the existing atmosphere within the chamber, eliminating the source of foreign particles while achieving effective drying through controlled evaporation and air circulation.
Solution Approach 2:
The patent extracts the harmful element (outside air containing foreign particles) from the drying process. By eliminating the need for external air intake and instead using internal air recirculation with controlled humidity and temperature, the system achieves drying without introducing contaminants.
2Object-affected harmful factors
If a filter is used to clean outside air for drying, then foreign particles are removed to some extent, but the filter effectiveness must be compromised to maintain adequate air flow
Solution Approach 1:
The patent removes the filter component entirely from the drying system by eliminating the need for outside air intake. The closed chamber design with internal air recirculation achieves both particle elimination and adequate air flow without requiring filtration, thus resolving the trade-off between filter effectiveness and air flow capacity.
3Temperature
If external heating is used to heat the drying air, then the air temperature is increased for drying, but only limited efficiency can be achieved
Solution Approach 1:
The patent replaces external mechanical heating systems with internal heat generation methods, such as infrared radiators or direct resistance heating elements positioned within the treatment chamber. This substitution enables more efficient and rapid heating of the drying air, significantly improving drying efficiency while maintaining precise temperature control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures effective drying of semiconductor articles within the chamber, minimizing contamination risks and reducing operational costs by maintaining a closed system and optimizing condensation processes.
Implementation Method 1
drying of the articles is achieved by means of a stream of hot air... a condensation dryer connected to the treatment chamber, wherein the arrangement is adapted to circulate the gas within the closed treatment chamber to the condensation dryer
Implementation Method 2
heated up... by means of a heat exchanger and condenser plates for efficient moisture removal
Implementation Method 3
an arrangement for moving a gas within the treatment chamber when it is closed, wherein the arrangement is adapted to circulate the gas within the closed treatment chamber
Data Source
AI summary
An apparatus and a method serve for cleaning articles used in the production of semiconductors, such as wafers, containers for transporting wafers (known as FOUPs), LCD substrates and photomasks. The articles are cleaned in a treatment chamber by means of a liquid and subsequently dried. A drying gas, such as air, is circulated within the treatment chamber and a condensation dryer is provided for extracting moisture from the gas.