Semiconductor Fin Pitch Optimization in Standard Cell Layouts
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Solution Overview
Problem
Current semiconductor device design methods face challenges in optimizing track numbers and fin pitches in standard cells, leading to inefficient layout verification and manufacturing complexities.
Innovation Solution
A method and system for designing semiconductor devices that involve determining and placing active and dummy fin pitches in standard cell layouts, optimizing the cell height and track numbers by using processor-based systems to verify the placement of active and dummy fins within defined regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If existing design methods are used to place fins in standard cells, then the design process is simpler, but the track number and fin pitches cannot be optimized, leading to larger cell sizes and reduced scalability
Solution Approach 1:
The standard cell layout is divided into multiple tracks, with each track containing specific fins (active fins, dummy fins, boundary fins). This segmentation allows independent optimization of fin placement in each track, enabling systematic optimization of track numbers and fin pitches while maintaining manageable design complexity through structured organization
Solution Approach 2:
The method performs preliminary determination of optimal track numbers and fin pitches before actual fin placement. By calculating and establishing the optimal configuration in advance based on cell height and design rules, the system enables efficient manufacturing without requiring complex adjustments during later design stages
2Productivity
If the number of tracks and fin pitches are increased to optimize standard cell layout, then manufacturing efficiency improves, but it becomes difficult to adhere to design rules and maintain scalability
Solution Approach 1:
The system systematically varies parameters including track numbers, fin pitches (first fin pitch within active region, second fin pitch within dummy region, third fin pitch between active and dummy regions), and fin configurations to find optimal values that simultaneously satisfy design rules and maximize manufacturing efficiency. This parameter optimization is performed within constraints defined by cell height and boundary line requirements
Solution Approach 2:
The verification process provides feedback on whether the determined track numbers and fin pitches satisfy design rules. This feedback loop allows iterative adjustment of the layout configuration to ensure compliance with design constraints while maintaining optimized parameters for manufacturing efficiency
3Ease of operation
If active and dummy fins are placed without optimized fin pitches, then the placement process is faster, but the standard cell size increases and complex structures cannot be implemented
Solution Approach 1:
Optimal fin pitches are determined in advance before the actual fin placement process. The first fin pitch for active fins, second fin pitch for dummy fins, and third fin pitch between them are calculated based on cell height and design rules, enabling efficient placement without iterative adjustments while achieving minimized cell size and enabling complex structure implementation
Data Source
AI summary
A method of designing a semiconductor device and system for designing a semiconductor device are provided. The method of designing a semiconductor device includes providing a standard cell layout which includes an active region and a dummy region; determining a first fin pitch between a first active fin and a second active fin in the active region and a second fin pitch between a first dummy fin and a second dummy fin in the dummy region; placing the first and second active fins in the active region and the first and second dummy fins in the dummy region using the first and second fin pitches; and verifying the standard cell layout.