Semiconductor Humidity Control with Dry Gas Recirculation
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Solution Overview
Problem
Semiconductor substrate containers and stockers require improved cleanliness maintenance to prevent contamination and maintain production yields, as existing methods are inadequate in maintaining low humidity levels and cleanliness within these environments.
Innovation Solution
A humidity control system that uses sensors to maintain a predetermined humidity level, recirculates gases, and adds fresh dry gas when necessary to create a low humidity environment, coupled with vacuum decontamination chambers to remove contaminants from containers and stockers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If purge gas is provided to containers and stockers to prevent contamination, then cleanliness is improved, but humidity control becomes insufficient leading to contamination risks
Solution Approach 1:
The patent changes the parameter of humidity control by introducing a humidity control system that monitors and adjusts humidity levels within containers and stockers. This goes beyond simple purge gas provision by actively managing the humidity parameter to prevent contamination, directly addressing the insufficient humidity control identified in the contradiction.
Solution Approach 2:
The patent implements feedback mechanisms through humidity sensors that continuously monitor humidity levels and provide signals to the control system. This feedback loop enables dynamic adjustment of purge gas flow and humidity control actions, ensuring cleanliness is maintained while preventing humidity-related contamination.
2Reliability
If periodic cleaning of containers is performed to maintain cleanliness, then contamination is reduced, but production time and productivity are impacted
Solution Approach 1:
The patent applies preliminary action by implementing continuous humidity control and monitoring systems within containers and stockers before contamination can occur. This preventive approach eliminates the need for periodic cleaning interruptions, as cleanliness is maintained continuously through controlled humidity levels, thereby preserving production productivity.
Solution Approach 2:
The patent ensures continuity of useful action by maintaining constant humidity control and purge gas flow throughout the storage and transport process. This continuous protective action replaces discontinuous periodic cleaning, ensuring substrate cleanliness is maintained without interrupting production workflows.
3Device complexity
If humidity levels are not controlled in storage environments, then system complexity is reduced, but contamination risk increases affecting production yields
Solution Approach 1:
The patent implements self-service through autonomous humidity control systems that automatically monitor humidity levels and adjust purge gas flow without external intervention. The system serves itself by using sensor feedback to trigger control actions, providing contamination prevention while adding minimal operational complexity.
Solution Approach 2:
The patent introduces humidity sensors and control systems as intermediaries between the storage environment and the substrates. These intermediaries continuously monitor and adjust environmental conditions, providing a buffer that prevents contamination while managing system complexity through modular, standardized components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively maintains a clean and low humidity environment, reducing contamination and ensuring long-term cleanliness of semiconductor substrates by continuously monitoring and adjusting humidity levels and removing contaminants, thereby enhancing production yields.
Implementation Method 1
vacuum decontamination chambers to remove contaminants from containers and stockers
Implementation Method 2
A humidity control system that uses sensors to maintain a predetermined humidity level, recirculates gases, and adds fresh dry gas when necessary to create a low humidity environment
Data Source
AI summary
Method for forming a clean environment for semiconductor substrates with low humidity level including the steps of measuring a humidity level in the environment using a humidity sensor to keep the environment within a predetermined interval around a humidity set point or at a humidity set point and providing a gas to the environment, until the humidity level reduces to a value within the predetermined interval around the set point or to the set point.