Semiconductor Layout Design Active Cut Width Adjustment
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Solution Overview
Problem
The increasing demand for miniaturized semiconductor devices poses challenges in ensuring the reliability of layout designs, as existing technologies struggle to efficiently adjust critical dimensions without affecting gate dimensions, leading to variations in performance parameters like power, delay, and leakage.
Innovation Solution
A layout design system comprising a processor, storage module, and generation module that adjusts the width of active cut designs within standard cell designs using markers, allowing for precise adjustments without altering gate dimensions, thereby optimizing performance and reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the width of active cut design is adjusted to optimize performance parameters, then power, delay, and leakage are improved, but gate dimensions may be inadvertently altered affecting device reliability
Solution Approach 1:
The patent segments the adjustment process into two independent parts: (1) adjusting the width of the active cut design, and (2) maintaining gate dimensions fixed. This is achieved by introducing markers that define the boundaries of the active cut region, allowing the width to be modified without affecting the gate structure. The segmentation enables independent optimization of performance parameters while preserving manufacturing precision for critical gate dimensions.
Solution Approach 2:
The patent introduces markers as intermediary elements that mediate between the active cut design and the gate structure. These markers serve as reference points that define the boundaries of the active cut region, allowing the width to be adjusted while maintaining a clear separation from the gate dimensions. The markers act as a buffer that prevents direct interference between width adjustment operations and gate dimension integrity.
2Productivity
If existing technologies are used to adjust critical dimensions, then some performance optimization is achieved, but the process is inefficient and may affect gate dimensions
Solution Approach 1:
The patent applies preliminary action by pre-defining markers at the boundaries of the active cut region before performing width adjustments. These markers establish reference points in advance, enabling rapid and accurate width modifications without requiring complex recalculations or risking gate dimension changes. This preliminary setup significantly improves design adjustment efficiency while maintaining layout design reliability through the constrained adjustment mechanism.
Data Source
AI summary
According to example embodiments, a layout design system includes a processor, a storage module configured to store a standard cell design, and a generation module. The standard cell design includes an active area and a normal gate area on the active area. The generation module is configured to receive the standard cell design, to adjust a width of an active cut design crossing the active area of the standard cell design, and to output a chip design including a design element using the processor. The design element includes the active cut design having the width adjusted.