Semiconductor Layout On-Grid Cell Width Design
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Solution Overview
Problem
Conventional semiconductor layout structures do not consistently include on-grid layout structures, which hinders the efficient integration and placement of standard cells with different cell widths, affecting the overall integration efficiency of integrated circuits.
Innovation Solution
A method is introduced where a first active feature group is formed with dummy features on either side, ensuring the cell width is a multiple of the poly pitch, achieved through calculations or look-up tables, and generated using CAD tools to create an on-grid layout structure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If standard cells with different cell widths are used to construct ICs, then the functionality and complexity of ICs can be improved, but the integration efficiency and placement routing compatibility deteriorate because not all cell widths form on-grid layout structures
Solution Approach 1:
The standard cell width is segmented into multiple poly pitch units. By dividing the cell width into integer multiples of the poly pitch (W = N × P), the layout is broken down into standardized segments that can be systematically arranged, ensuring on-grid compatibility while supporting different functional complexities.
Solution Approach 2:
The cell width parameter is changed to be a multiple of the poly pitch parameter. This parameter transformation ensures that all standard cells, regardless of their functional complexity, adhere to the on-grid layout requirement, thereby improving placement and routing efficiency across the entire IC design.
2Adaptability or versatility
If cell width is increased to accommodate complex standard cells, then the functionality of ICs is improved, but the layout structure deviates from on-grid requirements, harming placement and routing efficiency
Solution Approach 1:
Complex standard cells are segmented into multiple poly pitch units along the width direction. This segmentation allows the cell to maintain its functional complexity while adhering to the on-grid layout structure, ensuring that placement and routing tools can efficiently handle the design.
Solution Approach 2:
The poly pitch-based width definition creates a universal layout standard that serves multiple functions: it accommodates cells of varying complexity, maintains on-grid compatibility, and enables efficient automated placement and routing. This universal approach allows different standard cells to be integrated seamlessly.
3Productivity
If on-grid layout structure is enforced for all standard cells, then placement and routing efficiency is improved, but the flexibility in designing standard cells with optimal cell widths is reduced
Solution Approach 1:
The cell width parameter is transformed into a discrete set of values that are integer multiples of the poly pitch. This parameter change maintains design flexibility within the on-grid framework, allowing designers to select from various standardized width options (1P, 2P, 3P, etc.) depending on the functional requirements of each standard cell.
Solution Approach 2:
The on-grid layout structure provides a dynamic framework where standard cells can be flexibly arranged and scaled. By defining cell widths as multiples of poly pitch, the design can adapt to different functional requirements while maintaining compatibility with automated placement and routing tools.
Data Source
AI summary
A method for designing a semiconductor layout structure includes following steps. A first active feature group including at least a first active feature is received, and the first active feature includes a first channel length. A pair of first dummy features is introduced to form a first cell pattern. The first dummy features include a first dummy width. A first spacing width is defined between the first active feature group and one of the first dummy features and a third spacing width is defined between the first active feature group and the other first dummy feature. The first cell pattern includes a first cell width and a first poly pitch, and the first cell width is a multiple of the first pitch. The receiving of the first active feature group and the introducing of the first dummy features are performed in by at least a computer-aided design tool.