Automated Semiconductor Layout Pattern Generation
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Solution Overview
Problem
Current methods for designing semiconductor integrated circuit layouts require significant human effort and time, as they involve drawing and modifying numerous layout patterns for different process technologies, leading to a high probability of errors and inefficiencies.
Innovation Solution
A method and apparatus that automatically generate layout patterns for semiconductor integrated circuits by using process technology definition data and device structure data from predefined files, determining the structure of each layer based on the device template and process technology, thereby reducing human error and effort.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If humans draw all layout patterns manually using a drawing apparatus, then layout patterns can be created for each process technology, but the work requires much effort and time and has a high probability of drawing errors
Solution Approach 1:
The patent uses automatic pattern generation that copies and modifies basic patterns through algorithmic processes rather than manual drawing. The system generates layout patterns by processing device structure definition files and process technology definition files, creating accurate patterns without human drawing errors.
Solution Approach 2:
The patent replaces the mechanical manual drawing process with an automated computational system. Instead of humans using drawing apparatuses, the system uses software that processes definition files to automatically generate layout patterns, eliminating human error and reducing time consumption.
2Adaptability or versatility
If humans draw basic layout patterns and manually input parameter values, then layout patterns can be generated with size variations, but there is a probability of basic layout pattern drawing errors or parameter value input errors
Solution Approach 1:
The patent automatically changes parameters such as size and dimensions by processing process technology definition files that contain parameter definitions. The system automatically adjusts layout pattern dimensions based on process technology requirements without manual parameter input, eliminating input errors while maintaining adaptability.
Solution Approach 2:
The system copies basic layout patterns and automatically modifies them according to process technology definitions stored in files. This automated copying and modification process maintains accuracy while enabling size variations through algorithmic parameter adjustment rather than manual input.
3Adaptability or versatility
If layout patterns are drawn and stored for each process technology, then appropriate patterns can be selected for each process, but a large number of layout patterns must be drawn beforehand requiring much effort and time
Solution Approach 1:
The patent creates a universal pattern generation system that can handle multiple process technologies through a single automated process. Instead of manually creating separate patterns for each process technology, the system uses definition files that describe process requirements and automatically generates appropriate patterns, making the system multi-functional across different technologies.
Solution Approach 2:
The system copies and adapts basic patterns automatically for different process technologies by processing definition files. This automated copying process eliminates the need to manually create and store numerous process-specific patterns, significantly improving productivity while maintaining process technology compatibility.
4Adaptability or versatility
If humans change layout patterns using a drawing apparatus when process technology changes, then layout patterns can be updated for new processes, but much effort and time must be expended each time
Solution Approach 1:
The patent implements a dynamic pattern generation system that automatically adapts to process technology changes. Instead of static manually-created patterns that require re-drawing when processes change, the system dynamically generates patterns by processing updated process technology definition files, enabling quick adaptation to new processes.
Solution Approach 2:
The system replaces manual mechanical drawing and modification with automated computational processing. When process technology changes, the system automatically processes new definition files and generates updated patterns without human intervention, eliminating the time-consuming manual modification process.
Data Source
AI summary
A method includes: obtaining process technology definition data related to a process technology of each layer forming a basic cell, from a process technology definition file defining process technology definition data related to a process technology for use in fabricating a semiconductor integrated circuit, thereby holding a process technology definition table; obtaining device structure data including data related to a device template which defines a structure of each layer of the basic cell and data related to the structure of the layer defined in accordance with the device template, from a device structure definition file, thereby holding the obtained device structure data as a device structure definition table; and determining the structure of each layer defined in accordance with the device template held as the obtained device structure data, thereby generating the layout pattern of the basic cell forming the semiconductor integrated circuit.