Semiconductor Layout Track Pitch Adjustment for Tall Cells

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Solution Overview

Problem

In integrated circuit (IC) layout design, tall-row height cells or mixed-row height cells lead to redundant tracks due to the same pitch of tracks as the original design, resulting in suboptimal performance and operating speed due to unnecessary metal segments.

Innovation Solution

The method involves adjusting the track pitch to decrease the number of tracks in the cell, allowing for wider and shorter conductive segments with fewer tracks, thereby boosting operating speed and optimizing layout design.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Speed

If the track pitch is kept at the original design value, then the layout structure is simple and easy to manufacture, but redundant tracks and metal segments are created, reducing operating speed and performance

Engineering Contradiction:
Improveoperating speedVSAvoidlayout structure
Core Design Contradiction:
SpeedVSDevice complexity

Solution Approach 1:

The patent applies parameter changes by adjusting the track pitch from the original design value to an optimized value. Specifically, the track pitch is modified to accommodate tall-row height cells and mixed-row height cells, reducing the number of redundant tracks and metal segments. This parameter optimization directly improves operating speed while managing layout complexity through systematic adjustment of pitch values.

Inventive Principle:
Principle #35Parameter changes

2Area of stationary object

If tall-row height cells or mixed-row height cells are used, then performance and area co-optimization is achieved, but redundant tracks and metal segments are created due to the same pitch of tracks

Engineering Contradiction:
Improvearea usageVSAvoidnumber of tracks
Core Design Contradiction:
Area of stationary objectVSQuantity of substance

Solution Approach 1:

The patent optimizes the track pitch parameter to match the height variations in tall-row and mixed-row cells. By adjusting the pitch from the original uniform value to an optimized value, the layout achieves better area utilization without creating redundant tracks, thus reducing both area usage and the quantity of metal segments.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent introduces dynamic track pitch adjustment, where the pitch varies depending on the cell type (standard, tall, or mixed-row). This dynamic approach allows the layout to adapt to different cell heights, eliminating redundant tracks while maintaining area efficiency.

Inventive Principle:
Principle #15Dynamics

3Productivity

If the number of tracks is reduced by increasing track pitch, then operating speed is boosted and area usage is reduced, but the layout design becomes more complex

Engineering Contradiction:
Improveoperating speedVSAvoidlayout design
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent systematically changes the track pitch parameter to optimize both operating speed and area usage. By carefully selecting pitch values that eliminate redundant tracks while maintaining design rules, the patent achieves productivity improvement without excessive complexity increase.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent segments the layout into different regions with different track pitch values, optimized for specific cell types. This segmentation allows reduction of redundant tracks in tall-cell regions while maintaining standard pitch in other regions, balancing productivity gains with design complexity management.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS20240104286A1Method and non-transitory computer-readable medium for generating a layout of a semiconductor device
Publication Date: 2024.03.28 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20240104286A1 patent drawing
  • US20240104286A1 patent drawing
  • US20240104286A1 patent drawing

AI summary

The present disclosure provides a method and a non-transitory computer-readable medium for generating a layout of a semiconductor device. The method includes placing a first cell in the layout, providing a polysilicon pattern in the first cell extending along a first direction, designating a plurality of tracks on which metal segments can be placed, the plurality of tracks being across the polysilicon pattern and extending along a second direction different from the first direction. Two adjacent tracks of the plurality of tracks are spaced apart by a first pitch. The method further includes determining whether a number of the tracks in the first cell exceeds a predetermined number, and increasing the first pitch of the tracks so as to decrease the number of the tracks in the first cell to the predetermined number.