Semiconductor Light-Emitting Lens Alignment Using Light-Blocking Patterns

The patent creates a virtual image of the alignment mark on the front surface by reflecting light from the back surface alignment mark through the substrate. This virtual image serves as a reference that accounts for refractive index effects, allowing accurate alignment without direct through-substrate measurement. The copying approach transfers the alignment reference to a location where it can be used without suffering from refractive index distortion.

The patent introduces a light-blocking structure as an intermediary element that enables alignment verification without requiring through-substrate measurement. The light-blocking structure is positioned on the front surface and blocks light in the exposure process, creating a visible pattern that confirms proper alignment between the current injection region and the photosensitive member pattern. This intermediary approach allows measurement and verification to be performed on the front surface rather than through the substrate.

The patent employs alignment marks and light-blocking structures that are formed as part of the standard fabrication process on the substrate itself. These features serve dual purposes: they are functional elements of the device and simultaneously provide alignment references. This self-service approach eliminates the need for specialized external alignment tools or expensive measurement equipment, as the substrate provides its own alignment infrastructure through the integrated marks and blocking structures.