Semiconductor Metal Column Miniaturization via Polymer Phase Separation

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Solution Overview

Problem

Existing techniques fail to effectively miniaturize metal columns such as through-silicon vias and bumps in semiconductor devices, which are crucial for the miniaturization of 3-dimensional integrated circuits.

Innovation Solution

A semiconductor device configuration featuring a metal column surrounded by a polymer layer and a guide, where the polymer layer is interposed between the metal column and the guide, allowing for the miniaturization of metal columns through a heat treatment process that phase-separates the metal particles and polymers, enabling the formation of metal columns with reduced diameters and intervals.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Length of moving object

If conventional techniques are used to form metal columns, then the metal columns can be formed with sufficient structural integrity, but the metal column diameter and interval cannot be sufficiently miniaturized

Engineering Contradiction:
Improvemetal column diameterVSAvoidmetal column formation precision
Core Design Contradiction:
Length of moving objectVSManufacturing precision

Solution Approach 1:

A polymer layer is introduced as an intermediary substance between the metal particles and the guide structure. The polymer layer has selective affinity that causes metal particles to aggregate away from the guide surface, enabling precise control of metal column position and diameter. This intermediary layer resolves the contradiction by providing a mechanism to achieve both miniaturization and formation precision through phase separation during heat treatment.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention utilizes phase separation by changing temperature parameters during heat treatment. By heating the mixture of metal particles and polymer to a temperature where phase separation occurs, the metal particles automatically aggregate into columns with controlled diameter and spacing. This parameter change enables simultaneous achievement of miniaturization and manufacturing precision.

Inventive Principle:
Principle #35Parameter changes

2Length of moving object

If metal column diameter is reduced to miniaturize 3D integrated circuits, then wire capacitance decreases, but the structural integrity and electrical connection reliability become difficult to maintain

Engineering Contradiction:
Improvemetal column diameterVSAvoidelectrical connection reliability
Core Design Contradiction:
Length of moving objectVSReliability

Solution Approach 1:

The polymer layer serves as a mediator that enables reliable electrical connections even in miniaturized metal columns. During heat treatment, the polymer phase-separates and forms a controlled interface, ensuring proper metal column formation with sufficient structural integrity and electrical conductivity while maintaining miniaturized dimensions.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention creates a composite structure consisting of metal particles embedded in a polymer matrix during the forming process. This composite approach allows the metal columns to achieve both miniaturized dimensions and reliable electrical properties by utilizing the synergistic effects of metal conductivity and polymer structural support during formation.

Inventive Principle:
Principle #40Composite materials

3Length of moving object

If advanced techniques are used to form fine metal columns, then miniaturization can be achieved, but the manufacturing process complexity and cost increase

Engineering Contradiction:
Improvemetal column diameterVSAvoidmanufacturing process complexity
Core Design Contradiction:
Length of moving objectVSDevice complexity

Solution Approach 1:

The invention employs self-organization and self-assembly mechanisms where metal particles automatically aggregate into column structures through phase separation during heat treatment. This self-service approach eliminates the need for complex lithography and etching processes, achieving miniaturization through a simpler, more cost-effective manufacturing process.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The invention replaces complex mechanical manufacturing steps (such as lithography, etching, and plating) with a thermal processing approach. By using heat treatment to induce phase separation and self-organization, the manufacturing process becomes simpler and more cost-effective while still achieving fine metal column formation.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enables the miniaturization of metal columns, reducing their diameter and interval, which in turn decreases the capacitance of wires and allows for the formation of fine, high-aspect-ratio penetration electrodes at a lower cost, facilitating the miniaturization of 3-dimensional integrated circuits.

Implementation Method 1

subjecting the mixture to a heat treatment so that the polymers agglomerate to the guide to form a polymer layer that makes contact with the guide and the metal particles agglomerate away from the guide with the polymer layer interposed therebetween to form a metal column

Methodology Applied
Scientific EffectPhase separation: Phase Change

Data Source

PatentUS10483240B2Semiconductor device and method for manufacturing the same
Publication Date: 2019.11.19 KIOXIA CORP
  • US10483240B2 patent drawing
  • US10483240B2 patent drawing
  • US10483240B2 patent drawing

AI summary

A semiconductor device includes a metal column that extends in a stretching direction; a polymer layer that surrounds the metal column from a direction crossing the stretching direction; and a guide that surrounds the polymer layer in the crossing direction so as to be spaced from the metal column with the polymer layer interposed therebetween. A method for manufacturing semiconductor devices includes a step of filling a mixture containing metal particles and polymers in a guide; and a step of subjecting the mixture to a heat treatment so that the polymers agglomerate to the guide to form a polymer layer that makes contact with the guide and the metal particles agglomerate away from the guide with the polymer layer interposed therebetween to form a metal column that stretches in a stretching direction of the guide from the metal particles.