Semiconductor Structure Metallic Shielding Layer

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Solution Overview

Problem

The miniaturization of semiconductor devices leads to increased complexity in manufacturing and integration, resulting in issues such as poor electrical interconnection, delamination, and electromagnetic interference, which affect the performance and reliability of semiconductor structures.

Innovation Solution

A semiconductor structure is designed with a metallic layer surrounding the die and substrate, electrically connected to a conductive trace and grounded, providing electromagnetic shielding to prevent interference and improve operational stability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If semiconductor devices are miniaturized and integrated in high-density configurations, then device functionality and integration amount increase, but manufacturing complexity increases and causes poor electrical interconnection, delamination, and electromagnetic interference

Engineering Contradiction:
Improvedevice functionalityVSAvoidmanufacturing complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent segments the semiconductor structure into distinct functional layers including a substrate, molding compound, and a separate metallic shielding layer. This segmentation allows each layer to be optimized independently - the substrate for electrical interconnection, the molding for protection, and the metallic layer for electromagnetic shielding - thereby managing manufacturing complexity while maintaining high functionality

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The metallic shielding layer acts as an intermediary element between the internal semiconductor components and the external electromagnetic environment. This intermediate layer absorbs or reflects electromagnetic interference before it reaches sensitive components, resolving the contradiction by adding a dedicated functional layer that protects against interference without complicating the core device architecture

Inventive Principle:
Principle #24Intermediary (Mediator)

2Adaptability or versatility

If manufacturing operations are increased for integration of various semiconductor devices, then device functionality improves, but deficiencies such as poor electrical interconnection, delamination, and interference occur

Engineering Contradiction:
Improvedevice functionalityVSAvoidelectrical interconnection quality
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

The metallic shielding layer is incorporated into the molding structure beforehand to prevent electromagnetic interference before it can affect electrical interconnection quality. This preventive measure addresses potential reliability issues arising from increased manufacturing operations by establishing protective barriers during the manufacturing process itself rather than as a post-processing fix

Inventive Principle:
Principle #11Beforehand cushioning (Prior cushioning)

3Object-affected harmful factors

If metallic layer is added to provide electromagnetic shielding, then electromagnetic interference is reduced, but device complexity increases

Engineering Contradiction:
Improveelectromagnetic interferenceVSAvoidstructure complexity
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The metallic layer serves multiple functions simultaneously: it provides electromagnetic shielding, acts as a ground reference for signal traces, and forms part of the overall package structure. This multi-functionality reduces the need for separate dedicated components, thereby limiting the increase in device complexity while achieving effective electromagnetic interference reduction

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The metallic layer effectively isolates the semiconductor structure from external electromagnetic radiation, reducing interference and enhancing the performance and reliability of the semiconductor devices by grounding the conductive trace and die.

Implementation Method 1

a metallic layer surrounding the molding and the substrate, wherein the metallic layer is electrically connected to at least a portion of the conductive trace exposed through the substrate

Methodology Applied
Scientific EffectElectromagnetic shielding: Faraday Cage

Data Source

PatentUS11158586B2Semiconductor structure and manufacturing method thereof
Publication Date: 2021.10.26 NAN YA TECH
  • US11158586B2 patent drawing
  • US11158586B2 patent drawing
  • US11158586B2 patent drawing

AI summary

The present disclosure relates to a semiconductor structure and a method of manufacturing the semiconductor structure. The semiconductor structure includes a substrate including a first surface and a conductive trace extending over the substrate; a die disposed over the first surface of the substrate; a molding disposed over the first surface of the substrate and covering the die; and a metallic layer surrounding the molding and the substrate, wherein the metallic layer is electrically connected to at least a portion of the conductive trace exposed through the substrate.