Semiconductor Fluid Supply Nozzle for Homogeneous Solution Mixing
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Solution Overview
Problem
Existing semiconductor substrate treatment processes face challenges in ensuring that multiple solutions are homogeneously mixed, leading to potential unevenness on the substrate and difficulties in maintaining semiconductor quality.
Innovation Solution
A fluid supply nozzle with a nozzle body, solution supply channels, a solution guide device, and a rotary cartridge that mixes multiple solutions through a combination of rotary currents, eddy currents, and blade rotation to achieve homogeneous mixing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple solutions are supplied to a nozzle for substrate treatment, then the treatment liquid can be formed, but the solutions are not homogeneously mixed leading to unevenness on the substrate
Solution Approach 1:
The patent employs a rotary cartridge with blades that rotates within the nozzle body to dynamically mix multiple solutions. The rotation creates eddy currents and turbulent flow patterns that enhance mixing efficiency, transforming a static mixing problem into a dynamic solution that achieves homogeneous treatment liquid
Solution Approach 2:
The solution guide device with inclined screw threads acts as an intermediary mechanism between the solution supply channels and the rotary cartridge. It guides multiple solutions onto the rotating blades, facilitating their interaction and mixing through the mechanical action of the rotating intermediary structure
2Manufacturing precision
If a rotary cartridge with blades is added to mix solutions, then mixing efficiency is improved, but the device complexity increases
Solution Approach 1:
The patent merges multiple functions into the nozzle structure: the nozzle body serves as both the housing and the mixing chamber, the solution guide device integrates guiding and flow path functions, and the rotary cartridge combines mixing blades with rotational motion. This functional merging achieves homogeneous mixing while controlling overall structural complexity
Solution Approach 2:
The rotary cartridge is designed to be replaceably mounted, allowing easy maintenance and replacement without disassembling the entire nozzle. The structure enables self-service type maintenance where the mixing component can be independently accessed and replaced, reducing operational complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The nozzle effectively mixes multiple solutions into a homogeneous treatment liquid, ensuring consistent substrate treatment and improving semiconductor quality by eliminating unevenness.
Implementation Method 1
a solution guide device configured to guide the plurality of solutions and generate a rotary current or an eddy current to mix the plurality of solutions
Implementation Method 2
a rotary cartridge configured to accelerate the mixing of the plurality of solutions to generate a homogeneous treatment liquid
Data Source
AI summary
A fluid supply nozzle for semiconductor substrate treatment, which supplies a treatment liquid in which a plurality of solutions are mixed to a semiconductor substrate, includes a nozzle body configured to mix the plurality of solutions to form a treatment liquid when the plurality of solutions are supplied into an inner space of the nozzle body, the nozzle body having a shape with an open upper portion, a solution supply channel with a plurality of solution supply pipes for supplying the plurality of solutions to the inner space, a solution guide device configured to guide the plurality of solutions and generate a rotary current or an eddy current to mix the plurality of solutions, and a rotary cartridge configured to accelerate the mixing of the plurality of solutions to generate a homogeneous treatment liquid.