Semiconductor Package Through-Via Layout to Minimize Plating Dimples
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Solution Overview
Problem
Conventional large-area vias in semiconductor packages face challenges with dimple formation during plating, leading to increased plating processes and reduced product yield due to the difficulty in filling large-diameter via holes with metal materials, which affects the reliability and heat dissipation characteristics of printed circuit boards.
Innovation Solution
The semiconductor package incorporates a structure with multiple sub-vias arranged in a bar shape, where the width of the sub-vias in the first direction is greater than in the second direction, minimizing dimple formation by reducing the number of plating processes and maintaining consistent plating speed across different via groups, thereby improving heat dissipation and reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a large-diameter via hole is filled with metal material to create a large-area via, then heat dissipation characteristics and shielding characteristics are improved, but it becomes difficult to fill the via hole completely, resulting in dimple formation and reduced reliability
Solution Approach 1:
The large-area via is divided into multiple sub-vias arranged in an array pattern. Each sub-via has a smaller diameter that can be completely filled with metal material through plating processes, eliminating the dimple formation issue while collectively providing the required large effective area for heat dissipation and shielding functions.
2Temperature
If the width of the via in the first direction is increased to improve heat dissipation, then heat dissipation characteristics are improved, but the via requires more plating processes and creates larger dimples
Solution Approach 1:
The via structure is segmented into multiple sub-vias with controlled dimensions. By arranging multiple smaller sub-vias in an array rather than using one large via, the effective heat dissipation area is increased while each individual sub-via can be plated in fewer processes with smaller dimples.
Solution Approach 2:
Instead of increasing the width in one direction which exacerbates dimple formation, the solution distributes the heat dissipation function across multiple dimensions by arranging sub-vias in an array pattern, achieving large effective area through spatial distribution rather than single-direction expansion.
3Temperature
If conventional large-area vias are used, then heat dissipation characteristics are improved, but dimple formation affects via hole processing during additional lamination and reduces reliability
Solution Approach 1:
The large-area via structure is segmented into multiple small sub-vias that can be completely filled with metal material. This eliminates the dimple formation problem that compromises via hole processing during lamination, thereby improving the overall reliability of the printed circuit board while maintaining the heat dissipation function.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the number of plating processes, minimizes dimple size, and maintains plating flatness, enhancing the reliability and heat dissipation characteristics of the circuit board by dividing vias into groups with varying intervals, thus improving overall manufacturing efficiency and product yield.
Implementation Method 1
improving heat dissipation characteristics
Implementation Method 2
a first through electrode part passing through the first insulating layer
Implementation Method 3
conventional large-area via includes a dimple region concavely recessed toward an inner direction of the via hole on one surface
Data Source
AI summary
A semiconductor package according to an embodiment includes a first insulating layer; and a first through electrode part passing through the first insulating layer and having a shape elongated in a first direction; wherein the first through electrode part includes a plurality of first through electrodes spaced apart from each other in a second direction perpendicular to the first direction and a thickness direction; wherein at least one of the plurality of first through electrodes includes a first sub through electrode and a second sub through electrode spaced apart from each other in the first direction; and wherein at least one of the first sub through electrode and the second sub through electrode has a width in the first direction greater than a width in the second direction.


