Semiconductor-Particle Photosensitive Composition for Heat-Resistant Coating

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Solution Overview

Problem

Semiconductor particles, such as quantum dots, are weak against heat and require improved heat resistance and coatability in cured films, and existing photosensitive compositions do not adequately address these needs.

Innovation Solution

A photosensitive composition comprising semiconductor particles, photopolymerizable compounds, photopolymerization initiators, and stabilizers, with specific compound and stabilizer content ratios, including low molecular weight (meth)acrylate compounds and vinyl ether groups, to enhance heat resistance and coatability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a semiconductor particle is used in a photosensitive composition, then the cured film can be formed with desired optical properties, but the heat resistance of the cured film deteriorates

Engineering Contradiction:
Improveheat resistanceVSAvoidheat sensitivity of semiconductor particle
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent uses a composite approach by combining semiconductor particles with specific photopolymerizable compounds (low molecular weight (meth)acrylate compounds and vinyl ether compounds) to create a cured film matrix that protects the heat-sensitive semiconductor particles while maintaining optical properties. The composite structure allows the semiconductor particles to retain their optical functionality while the polymer matrix provides thermal stability.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent changes chemical parameters by selecting specific photopolymerizable compounds with defined molecular weights and functional groups. The use of low molecular weight (meth)acrylate compounds (molecular weight 180 or less) and vinyl ether compounds with specific (meth)acryloyl groups modifies the polymerization characteristics and crosslinking density, resulting in a cured film with improved heat resistance that protects the semiconductor particles.

Inventive Principle:
Principle #35Parameter changes

2Ease of operation

If conventional photosensitive composition is used, then the composition can be processed, but the coatability of the composition deteriorates

Engineering Contradiction:
ImprovecoatabilityVSAvoidprocessing difficulty
Core Design Contradiction:
Ease of operationVSEase of manufacture

Solution Approach 1:

The patent modifies the chemical composition parameters by incorporating low molecular weight (meth)acrylate compounds with viscosity of 1.2 cP or less at 25°C and specific vinyl ether compounds. These parameter changes result in a photosensitive composition with improved flow characteristics and coatability, allowing for better deposition and uniform film formation while maintaining processability.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The low molecular weight (meth)acrylate compounds and vinyl ether compounds act as intermediary substances that mediate between the semiconductor particles and the final cured film structure. These intermediaries improve the overall coatability of the composition by adjusting viscosity and surface tension, enabling smooth application while maintaining the integrity of the semiconductor particle dispersion.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition provides improved heat resistance and coatability, enabling the formation of cured films with enhanced properties suitable for ink-jet printing.

Implementation Method 1

a photopolymerizable compound (C), and a photopolymerization initiator (D)

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Data Source

PatentUS12384930B2Photosensitive composition
Publication Date: 2025.08.12 SUMITOMO CHEM CO LTD
  • US12384930B2 patent drawing
  • US12384930B2 patent drawing
  • US12384930B2 patent drawing

AI summary

The photosensitive composition according to the present invention is a photosensitive composition including a semiconductor particle (A), a photopolymerizable compound (C) and a photopolymerization initiator (D), in which the photosensitive composition satisfies any one or more of the following (a) to (c): (a) the photosensitive composition further includes a stabilizer (E), and a content of the stabilizer (E) is 8% by mass or more based on the total amount of the photosensitive composition; (b) the photopolymerizable compound (C) includes a (meth)acrylate compound (C1) having a molecular weight of 180 or less; and (c) the photopolymerizable compound (C) includes a compound (C2) having a vinyl ether group and a (meth)acryloyl group in the same molecule.