Semiconductor Process Prediction Model With Defect-Filtered Training

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Solution Overview

Problem

In semiconductor manufacturing, detecting abnormalities in electrical measurement data early in the process is challenging, which affects the yield of final products.

Innovation Solution

A training method for a semiconductor process prediction model that filters out samples with physical defects during the training process, ensuring that only data from defect-free samples is used to improve the accuracy of the model for predicting electrical measurement data.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If all samples including those with physical defects are used for training, then the training data volume is maximized, but the prediction accuracy for defect-free wafers deteriorates

Engineering Contradiction:
Improvetraining data volumeVSAvoidprediction accuracy
Core Design Contradiction:
Quantity of substanceVSMeasurement precision

Solution Approach 1:

The patent extracts and removes samples with physical defects from the training dataset. The filtering unit identifies defective samples based on process data and excludes them from training the prediction model, ensuring that only defect-free samples contribute to model learning, thereby resolving the contradiction between data volume and prediction accuracy.

Inventive Principle:
Principle #2Taking out (Extraction)

2Reliability

If the prediction model is trained to accurately predict electrical measurement data, then the ability to detect abnormalities improves, but the model complexity increases

Engineering Contradiction:
Improveabnormality detection capabilityVSAvoidmodel complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies preliminary action by filtering out defective samples before training the prediction model. This pre-processing step ensures that the model trains on clean, defect-free data, improving abnormality detection capability while avoiding the need for complex mechanisms to handle defective data during training.

Inventive Principle:
Principle #10Preliminary action

3Productivity

If physical defect detection is performed earlier in the process, then yield improvement is maximized, but the detection system complexity increases

Engineering Contradiction:
Improveyield improvementVSAvoiddetection system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent implements self-service by using the prediction model to automatically identify wafers with physical defects based on process data. The system performs self-detection without requiring additional complex external detection equipment, thereby achieving early defect detection and yield improvement while maintaining system simplicity.

Inventive Principle:
Principle #25Self-service

Data Source

PatentUS12339632B2Training method for semiconductor process prediction model, semiconductor process prediction device, and semiconductor process prediction method
Publication Date: 2025.06.24 UNITED MICROELECTRONICS CORP
  • US12339632B2 patent drawing
  • US12339632B2 patent drawing
  • US12339632B2 patent drawing

AI summary

A training method of a semiconductor process prediction model, a semiconductor process prediction device, and a semiconductor process prediction method are provided. The training method of the semiconductor process prediction model includes the following steps. The semiconductor process was performed on several samples. A plurality of process data of the samples are obtained. A plurality of electrical measurement data of the samples are obtained. Some of the samples having physical defects are filtered out according to the process data. The semiconductor process prediction model is trained according to the process data and the electrical measurement data of the filtered samples.