Semiconductor Device Protecting Element Using Two-Dimensional Electron Gas

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Solution Overview

Problem

Conventional semiconductor devices with protecting diodes require a large area to achieve sufficient surge resistance, limiting size reduction and complicating the manufacturing process.

Innovation Solution

A semiconductor device using a transistor with a two-dimensional electron gas channel as the protecting element, allowing for high surge resistance while reducing the area and maintaining a straightforward manufacturing process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a pn junction diode is used as a protecting element to increase surge resistance, then the surge resistance of the control electrode is improved, but the element area becomes large and the manufacturing process becomes complicated

Engineering Contradiction:
Improvesurge resistanceVSAvoidprotecting element area
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The patent changes the type of protecting element from a pn junction diode to a transistor with a two-dimensional electron gas layer channel. This parameter change enables the protecting element to achieve high current capability (several hundreds of milliamperes to one ampere) with a smaller element area, thereby resolving the contradiction between surge resistance and area size.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If a pn junction diode is used as a protecting element to increase surge resistance, then the surge resistance of the control electrode is improved, but additional manufacturing steps are required

Engineering Contradiction:
Improvesurge resistanceVSAvoidmanufacturing process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The transistor used as a protecting element can be formed using the same manufacturing process as the main HFET device. This multi-functionality approach allows the protecting element to be integrated without adding separate manufacturing steps, thereby resolving the contradiction between surge resistance and manufacturing process complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Area of stationary object

If the control electrode size is reduced for miniaturization, then the device size is reduced, but the surge breakdown voltage decreases

Engineering Contradiction:
Improvecontrol electrode areaVSAvoidsurge breakdown voltage
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The patent introduces a transistor-based protecting element as an intermediary component between the control electrode and the surge threat. This protecting element acts as a mediator that handles surge currents, allowing the control electrode to be miniaturized without compromising surge breakdown voltage, thereby resolving the contradiction between device size and surge reliability.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device achieves high surge resistance with a smaller protecting element area, capable of passing larger currents compared to traditional pn junction diodes, without complicating the manufacturing process.

Implementation Method 1

a transistor having a channel as a two-dimensional electron gas layer... The second transistor has a first protecting element ohmic electrode, a first protecting element gate electrode, and a second protecting element ohmic electrode, which are formed on the second element region. The second protecting element ohmic electrode is connected to the first gate electrode.

Methodology Applied
Scientific EffectTwo-dimensional electron gas conduction: Conduction (electrical)

Data Source

PatentUS8497553B2Semiconductor device
Publication Date: 2013.07.30 PANASONIC HOLDINGS CORP
  • US8497553B2 patent drawing
  • US8497553B2 patent drawing
  • US8497553B2 patent drawing

AI summary

A semiconductor device includes a first transistor formed on a first element region, and a first protecting element including a second transistor formed on a second element region. A second protecting element ohmic electrode is connected to a first gate electrode, a first protecting element ohmic electrode is connected to a first ohmic electrode, and a first protecting element gate electrode is connected to at least one of the first protecting element ohmic electrode and the second protecting element ohmic electrode. The second element region is smaller in area than the first element region.