Semiconductor Resistor Pattern Layout for Stable Resistance
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Solution Overview
Problem
Existing semiconductor devices face challenges in maintaining reliable resistance values and reducing pattern density differences between regions due to the overlap of dummy gate patterns with connection structures, leading to instability and variations in resistor patterns.
Innovation Solution
The semiconductor device design avoids placing dummy gate patterns below the connection regions of the resistor pattern, ensuring that the connection structure does not overlap with the dummy gate patterns, thereby stabilizing the resistance value and reducing variations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If dummy gate patterns are placed below the resistor pattern to maintain pattern density, then pattern density uniformity is improved, but the resistance value stability deteriorates due to unwanted coupling with connection structures
Solution Approach 1:
The dummy gate pattern is segmented into two distinct regions: a first region that overlaps with the resistor pattern body to maintain pattern density, and a second region that is spaced apart from connection structures to prevent unwanted coupling. This segmentation allows the dummy gate pattern to simultaneously fulfill both functions of density maintenance and electrical isolation.
Solution Approach 2:
Different portions of the dummy gate pattern are assigned different spatial relationships with the resistor pattern. The first region is positioned to overlap with the resistor body for density purposes, while the second region is positioned away from connection structures to avoid electrical interference. This local differentiation resolves the contradiction between density uniformity and resistance stability.
2Device complexity
If dummy gate patterns overlap with connection regions to simplify layout, then device complexity is reduced, but manufacturing precision deteriorates due to resistance variations
Solution Approach 1:
The dummy gate pattern is divided into a first region overlapping the resistor body and a second region spaced from connection structures. This segmentation simplifies layout by maintaining overall overlap while locally preventing connection interference, thus reducing device complexity without sacrificing manufacturing precision.
Solution Approach 2:
The dummy gate pattern exhibits different spatial characteristics at different locations: overlap with the resistor body in the first region for layout simplicity, and spacing from connection structures in the second region for precision. This local quality approach maintains simplicity while ensuring precision.
3Area of stationary object
If connection structures are placed close to dummy gate patterns to reduce area, then area efficiency is improved, but reliability deteriorates due to coupling effects
Solution Approach 1:
The dummy gate pattern is segmented such that the first region can be positioned close to the resistor body for area efficiency, while the second region is spaced apart from connection structures to prevent coupling effects. This allows compact layout without compromising reliability.
Solution Approach 2:
Different regions of the dummy gate pattern have different proximity relationships: close to the resistor body in the first region for area efficiency, and spaced from connection structures in the second region for reliability. This local differentiation achieves both compactness and stability.
Data Source
AI summary
A semiconductor device includes a substrate including a first region and a second region, a cell gate pattern on the first region of the substrate, a dummy gate pattern on the second region of the substrate, a resistor pattern on the second region of the substrate and over the dummy gate pattern, and a connection structure coupled to each of the connection regions. The resistor pattern includes a body region and connection regions at both sides of the body region. The dummy gate pattern overlaps the body region and does not be overlap the connection regions, when viewed in a plan view.