Semiconductor Seal Ring Stress Management
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Solution Overview
Problem
Conventional semiconductor devices experience chipping and cracking during the dicing process due to mechanical impact, with the passivation film peeling off, leading to reliability and moisture resistance issues.
Innovation Solution
A semiconductor device design featuring a seal ring surrounded by a first protective film with strategically formed openings and a cap layer, which blocks the transmission of impact and stress from the outside to the chip region, preventing peeling and corrosion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a seal ring is formed in the periphery of the chip region to prevent cracks from spreading, then the reliability of the semiconductor device is improved, but the passivation film peels off due to mechanical impact during dicing, causing harmful effects
Solution Approach 1:
The seal ring is segmented into alternating wiring portions and via portions, allowing the structure to absorb and distribute mechanical stress during dicing, preventing continuous crack propagation while maintaining protective function
Solution Approach 2:
The pad opening acts as an intermediary element that absorbs mechanical impact during dicing, preventing the force from transmitting to the passivation film and causing peeling, while the seal ring continues to provide crack protection
2Productivity
If the wafer is diced into individual chips, then productivity is improved, but chip regions near the scribe line are subjected to mechanical impact causing chipping and cracking
Solution Approach 1:
The seal ring is formed in advance in the periphery of the chip region before dicing, creating a protective barrier that prevents cracks from spreading during the subsequent dicing process, while the pad opening is strategically positioned to absorb impact forces
Solution Approach 2:
The pad opening serves as a cushioning element positioned beforehand to absorb mechanical impact during dicing, protecting the chip region from chipping and cracking while allowing efficient chip separation
Data Source
AI summary
A semiconductor device includes: an interlayer insulating film formed on a substrate; a wiring formed in the interlayer insulating film in a chip region of the substrate; a seal ring formed in the interlayer insulating film in a periphery of the chip region and continuously surrounding the chip region; and a first protective film formed on the interlayer insulating film having the wiring and the seal ring formed therein. A first opening is formed in the first protective film in a region located outside the seal ring when viewed from the chip region, and the interlayer insulating film is exposed in the first opening.


