Semiconductor Source Pad Segmentation for Low Resistance
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Solution Overview
Problem
Field effect transistors face challenges in minimizing electrical interference and resistance while maintaining low capacitance due to the design of source and drain pads, which affects their performance in semiconductor devices.
Innovation Solution
The semiconductor device incorporates a specific arrangement of source and drain electrodes, traces, vias, and pads with dielectric layers and metal structures that reduce resistance and capacitance by optimizing the layout and connections between these components, ensuring that the source and drain branches do not overlap, thereby minimizing electrical interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If source and drain pads are designed with large bonding areas to facilitate external circuit bonding, then ease of connection is improved, but electrical interference and resistance between source and drain increase
Solution Approach 1:
The source pad is segmented into multiple source electrodes (first source electrode, second source electrode, etc.) arranged in sequence along the first direction. This segmentation allows each electrode to have optimized dimensions and positioning, reducing the overall capacitance between source and drain while maintaining adequate bonding area through the collective arrangement of multiple electrodes.
Solution Approach 2:
The patent introduces a multi-dimensional layout where source and drain electrodes are arranged not only along the first direction but also positioned at different locations in the planar structure. The source electrodes are positioned to extend along the first direction while drain electrodes are arranged to minimize overlap, utilizing spatial distribution to reduce capacitance while maintaining bonding capability.
2Area of stationary object
If source and drain electrodes are positioned closer to reduce device area, then device compactness is improved, but resistance and electrical interference increase
Solution Approach 1:
The source electrodes and drain electrodes are designed with asymmetric positioning and dimensional characteristics. The source electrodes extend along the first direction with specific lengths and spacings that are optimized independently from the drain electrode configuration. This asymmetric design allows compact arrangement while controlling the resistance and capacitance characteristics through non-uniform spacing and positioning.
Solution Approach 2:
Different regions of the electrode structure are assigned different properties: the source electrodes have optimized dimensions and spacing for low resistance connection, while the drain electrodes are positioned to minimize capacitance coupling. The dielectric layer thickness and material properties are also optimized locally in different regions to achieve the desired electrical characteristics.
3Area of stationary object
If source and drain electrodes are positioned closer to reduce device area, then device compactness is improved, but electrical interference and capacitance increase
Solution Approach 1:
The source pad is segmented into multiple source electrodes (first source electrode, second source electrode, etc.) arranged in sequence along the first direction. This segmentation allows each electrode to have optimized dimensions and positioning, reducing the overall capacitance between source and drain while maintaining adequate bonding area through the collective arrangement of multiple electrodes.
Solution Approach 2:
The patent introduces a multi-dimensional layout where source and drain electrodes are arranged not only along the first direction but also positioned at different locations in the planar structure. The source electrodes are positioned to extend along the first direction while drain electrodes are arranged to minimize overlap, utilizing spatial distribution to reduce capacitance while maintaining bonding capability.
Data Source
AI summary
A semiconductor device includes an active layer, source electrodes, drain electrodes, gate electrodes, a first dielectric layer, source trace, first source vias, a second dielectric layer, a source pad, and second source vias. The first dielectric layer covers the source electrodes, the drain electrodes, and the gate electrodes. The source traces are disposed on the first dielectric layer, are electrically connected to the source electrodes, and are covered by the second dielectric layer. The source pad is disposed on the second dielectric layer, and includes a first source trunk, a first source branch, and a source sub-branch. The first source branch is protruded from the first source trunk and is electrically connected to one of the drain traces through the second source vias. The source sub-branch is protruded from the first source branch and is electrically connected one of the source electrodes through the third source vias.


