Semiconductor Package Thermal Layer Characterization Using GIXRD
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Solution Overview
Problem
There is a lack of accurate and reliable thermal characterization techniques for monitoring and analyzing the thermal characteristics of thermal conductive materials during the manufacturing of semiconductor packages.
Innovation Solution
The use of grazing angle X-ray diffraction (GIXRD) characterization to analyze the crystal structure of thermal conductive layers, specifically AlN, in semiconductor packages, allowing for the prediction of thermal properties such as cross-plane thermal conductivity and thermal anisotropy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional thermal characterization techniques are used, then manufacturing process is simple, but thermal property measurement accuracy is insufficient
Solution Approach 1:
The patent replaces direct thermal measurement methods with X-ray diffraction-based crystal structure analysis. By measuring crystal orientation and structure through GIXRD and predicting thermal properties from these measurements, the system achieves accurate thermal characterization without complex thermal testing equipment.
Solution Approach 2:
The patent introduces crystal structure parameters as an intermediary between manufacturing process and thermal properties. Instead of directly measuring thermal conductivity, the method measures crystal orientation and structure, then uses predictive models to determine thermal properties, simplifying the measurement process while maintaining accuracy.
2Productivity
If thermal properties are measured after manufacturing, then measurement equipment is simple, but process adjustment capability is lost
Solution Approach 1:
The patent performs crystal structure measurement during the manufacturing process rather than after completion. By measuring crystal orientation and structure at intermediate stages, the method enables real-time process monitoring and adjustment, allowing manufacturers to optimize thermal properties before final assembly.
Solution Approach 2:
The patent establishes a feedback loop where crystal structure measurements inform process adjustments. The measured crystal orientation and structure data are fed back to control manufacturing parameters, enabling continuous optimization of thermal conductive layer properties during production.
3Measurement precision
If destructive sampling is used for thermal measurement, then measurement accuracy is high, but manufacturing yield decreases
Solution Approach 1:
The patent replaces destructive thermal cutting or testing with non-destructive X-ray diffraction measurement. GIXRD can characterize crystal structure and predict thermal properties without damaging the sample, allowing full retention of manufactured components while achieving accurate thermal characterization.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method provides an accurate and non-destructive means to predict thermal properties of thermal conductive layers, enabling in-line monitoring and adjustment of manufacturing processes to ensure efficient heat dissipation in semiconductor packages.
Implementation Method 1
performing a grazing angle X-ray diffraction (GIXRD) characterization on the thermal conductive layer
Implementation Method 2
performing a grazing angle X-ray diffraction (GIXRD) characterization on the thermal conductive layer, and extracting crystal properties of the thermal conducive layer from a resulted diffractogram
Data Source
AI summary
A thermal characterization method and a method for manufacturing a semiconductor package are provided. The thermal characterization method includes: conducting preliminary experiments before manufacturing of the semiconductor structure, to establish correlations between crystal properties and thermal properties of thin film samples formed of a crystalline material identical with a crystalline material for forming the thermal conductive layer; performing a grazing angle X-ray diffraction (GIXRD) characterization on the thermal conductive layer during manufacturing of the semiconductor structure, and extracting crystal properties of the thermal conducive layer from a resulted diffractogram; and using the correlations established by the preliminary experiments to find thermal properties corresponding to the extracted crystal properties of the thermal conductive layer.


