Semiconductor By-Product Trap Using Temperature-Zoned Vortex Separation
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Solution Overview
Problem
Current semiconductor manufacturing processes face challenges in efficiently trapping reaction by-product mixtures containing both high-temperature thin films and low-temperature powders from unreacted gases, as existing trapping apparatuses require multiple units and complex temperature control, leading to increased complexity and potential contamination.
Innovation Solution
A single apparatus with a divided trapping region based on vertical temperature distribution, utilizing multiple-stage trapping structures with varying flow paths and vortex generation to separate and trap reaction by-products as thin films and powders, respectively, using a heater and coolant system to manage temperature and residence time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If multiple trapping apparatuses are used to trap reaction by-products at different temperature regions, then the trapping efficiency is improved, but the device complexity and process control complexity increase
Solution Approach 1:
The single trapping apparatus is divided into multiple trapping regions (first trapping region and second trapping region) with different temperature zones. Each region is equipped with specific trapping structures tailored to the temperature characteristics and by-product types, enabling efficient separation and trapping of different reaction by-products without requiring multiple separate apparatuses.
Solution Approach 2:
Multiple trapping functions for different temperature regions and by-product types are integrated into a single trapping apparatus. The apparatus combines high-temperature trapping structures and low-temperature trapping structures within one unified system, eliminating the need for multiple separate apparatuses while maintaining trapping efficiency.
2Reliability
If multiple trapping apparatuses are installed to handle different temperature regions, then the trapping completeness is improved, but the potential contamination risk increases
Solution Approach 1:
The trapping apparatus is segmented into distinct trapping regions with physical separation between high-temperature and low-temperature zones. This segmentation prevents mixing of different by-product types and eliminates cross-contamination risks that would occur with shared trapping components, while still achieving complete trapping of all by-products.
3Device complexity
If a single trapping apparatus is used for all reaction by-products, then the device complexity is reduced, but the trapping efficiency for multiple by-product types deteriorates
Solution Approach 1:
Different trapping structures are applied to different regions within the single apparatus based on local temperature conditions and by-product characteristics. The first trapping region uses structures optimized for high-temperature by-products, while the second trapping region uses structures optimized for low-temperature by-products, ensuring high trapping efficiency for each type within the simplified single-apparatus configuration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively traps reaction by-products in a single unit, reducing the need for multiple trapping apparatuses, simplifying process control, improving durability, and extending maintenance cycles, while maintaining high efficiency in semiconductor manufacturing.
Implementation Method 1
a heater (2) installed on a lower portion of an upper plate (12) of the housing (1)
Implementation Method 2
generating vortices by trapping structures provided in multiple stages and having level differences therebetween
Implementation Method 3
dividing the trapping region with a structure for generating multiple vortices and switching flow path directions using a trapping structure and a difference in vertical temperature distribution according to a distance spaced apart from a heater
Data Source
AI summary
An apparatus is for trapping multiple reaction by-products for a semiconductor process, in which a trapping region is divided by a difference in vertical temperature distribution according to a distance spaced apart from a heater and by structures for switching flow path directions and generating multiple vortices using a trapping structure, and reaction by-product mixtures contained in a gas, which is discharged after a process of depositing multiple different thin film layers is performed in a process chamber during a semiconductor manufacturing process, is trapped by a single trapping apparatus, such that a reaction by-product, which is aggregated in the form of a thin film in a relatively high-temperature region, is trapped by a first trapping part in an upper region, and a reaction by-product, which is aggregated in the form of powder in a relatively low-temperature region, is trapped by a second trapping part in a lower region.