Semiconductor Vacuum Pumping Lines With Filterless Vortex Decontamination
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Integrated circuit fabrication facilities face challenges in maintaining high efficiency and reducing manufacturing costs due to the accumulation of solid particles in vacuum systems, which can cause pump seizures and slow down the manufacturing process.
Innovation Solution
The use of rotational gas-flow systems, such as vortex generators and centrifugal force, to separate and trap solid particles from gas streams in vacuum pumping lines, employing filterless particle decontamination units to prevent particle buildup and facilitate self-cleaning of the vacuum system components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If vacuum pumps are used to maintain low pressure in processing chambers, then vacuum conditions are achieved for semiconductor fabrication, but solid particles accumulate in pumping lines causing pump seizures
Solution Approach 1:
The vortex generator creates rotational gas flow before particles reach the pump, separating particles from the gas stream in advance. This preliminary action prevents particles from entering the pump and accumulating, thereby maintaining pump reliability without requiring frequent maintenance shutdowns
Solution Approach 2:
The vortex generator acts as an intermediary device between the processing chamber and vacuum pump. It introduces rotational flow that mediates the interaction between gas and particles, causing particles to migrate to the pumping line wall where they can be removed without affecting pump operation
2Object-affected harmful factors
If filters are installed to remove particles from gas flow, then particle contamination is reduced, but system complexity and pressure drop increase
Solution Approach 1:
The invention replaces the traditional mechanical filter system with a vortex-based flow field approach. Instead of using physical filters that particles must pass through, the rotational gas flow naturally separates particles from the main stream through centrifugal forces, reducing mechanical complexity and pressure drop
Solution Approach 2:
The system uses pneumatic principles by creating a vortex flow within the gas stream itself. The rotational motion of the gas carries particles to the pumping line wall through fluid dynamic forces, eliminating the need for solid filter media and reducing system complexity
3Productivity
If vacuum systems operate continuously for high productivity, then manufacturing efficiency increases, but particle buildup requires periodic shutdowns for cleaning
Solution Approach 1:
The vortex generator creates a self-cleaning effect where the rotational gas flow continuously moves particles toward the pumping line wall. This self-service mechanism prevents particle accumulation without requiring external intervention or system shutdowns, enabling continuous operation and maintaining high productivity
Solution Approach 2:
The vortex-induced particle migration operates continuously as long as gas flow exists in the system. This continuous action ensures particles are constantly removed from the gas stream and deposited on the pumping line wall, eliminating the need for periodic maintenance interruptions and maintaining uninterrupted fabrication throughput
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively removes small particles from gas flows, reducing the risk of pump seizures and maintaining efficient operation by using centrifugal force and gravity to separate and confine particles, while also providing a self-cleaning mechanism for vacuum pumping lines.
Implementation Method 1
The use of rotational gas-flow systems, such as vortex generators and centrifugal force, to separate and trap solid particles from gas streams
Implementation Method 2
using centrifugal force and gravity to separate and confine particles
Data Source
AI summary
Methods and devices are provided wherein rotational gas-flow is generated by vortex generators to decontaminate dirty gas (e.g., gas contaminated by solid particles) in pumping lines of vacuum systems suitable for use at a semiconductor integrated circuit fabrication facility. The vacuum systems use filterless particle decontamination units wherein rotational gas-flow is applied to separate and trap solid particles from gas prior to the gas-flow entering a vacuum pump. Methods are also described whereby solid deposits along portions of pumping lines may be dislodged and removed and portions of pumping lines may be self-cleaning.