Semiconductor Device Integration Density via Zigzag Pillar Arrangement

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Solution Overview

Problem

Current semiconductor devices face challenges in increasing integration density due to the limitations of two-dimensional memory cell arrangements, which require expensive processing equipment and have drawbacks in three-dimensional arrangements.

Innovation Solution

The semiconductor device design includes first and second select lines with vertical pillars and subsidiary lines arranged in a zigzag pattern, with specific insulation layers and pitch configurations to enhance integration density without the need for expensive equipment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If two-dimensional memory cell arrangements are used to increase integration, then manufacturing cost increases due to expensive processing equipment, but device complexity remains manageable

Engineering Contradiction:
Improveintegration densityVSAvoidmanufacturing cost
Core Design Contradiction:
Quantity of substanceVSEase of manufacture

Solution Approach 1:

The patent transitions from two-dimensional planar memory cell arrangements to three-dimensional vertical pillar structures. Multiple vertical pillars are stacked in the vertical direction (third direction) while maintaining selective connectivity through subsidiary lines, enabling increased integration density without requiring expensive fine-pattern processing equipment for two-dimensional scaling

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Quantity of substance

If three-dimensional memory cell arrangements are formed to increase integration, then manufacturing complexity increases, but processing equipment costs are reduced

Engineering Contradiction:
Improveintegration densityVSAvoidmanufacturing complexity
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The three-dimensional structure is segmented into multiple vertical pillars (first, second, third, fourth vertical pillars) that can be formed through systematic stacking of insulating layers and conductive patterns. Each pillar is independently configurable with selective connectivity, allowing complex 3D arrangements to be built from simpler repeating units rather than requiring monolithic complex structures

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Multiple insulating layers (first, second, third insulating layers) are nested sequentially in the vertical direction, with each layer containing conductive patterns that form part of the vertical pillar structure. This nested stacking approach builds three-dimensional complexity through layered assembly, reducing manufacturing complexity compared to forming complex 3D structures in a single process

Inventive Principle:
Principle #7Nested doll (Nesting)

3Quantity of substance

If vertical pillars are arranged in zigzag pattern with alternating subsidiary lines, then integration density increases, but pattern alignment precision requirements increase

Engineering Contradiction:
Improveintegration densityVSAvoidpattern alignment precision
Core Design Contradiction:
Quantity of substanceVSManufacturing precision

Solution Approach 1:

The patent employs asymmetric zigzag arrangement of vertical pillars where first and second vertical pillars are positioned at different lateral locations relative to third and fourth vertical pillars. The subsidiary lines alternately connect different pairs of pillars (first subsidiary lines connect first and second pillars, second subsidiary lines connect third and fourth pillars), creating an asymmetric connectivity pattern that maximizes integration density while maintaining manufacturable alignment tolerances through systematic rather than random positioning

Inventive Principle:
Principle #4Asymmetry

Data Source

PatentUS10319741B2Semiconductor devices
Publication Date: 2019.06.11 SAMSUNG ELECTRONICS CO LTD
  • US10319741B2 patent drawing
  • US10319741B2 patent drawing
  • US10319741B2 patent drawing

AI summary

A semiconductor device includes first and second select lines, first and second vertical pillars, and first and second subsidiary lines. The select lines are spaced apart and include a first separating insulation layer therebetween. Each of the first and second vertical pillars is connected to a corresponding one of the first or second select lines. The first vertical pillars are closer to the first separating insulation layer. The second vertical pillars arranged in an oblique direction from the first vertical pillars. Each of the first subsidiary lines connects a pair of the first vertical pillars. Each of the second subsidiary lines connects a pair of the second vertical pillars adjacent. The first and second subsidiary lines are alternately disposed along a first direction, and ends of the first and second subsidiary lines are aligned along the first direction.