Sensing Device Pinhole Lithography Alignment
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Solution Overview
Problem
Current pinhole arrays in optical sensing devices face challenges with low light transmittance, alignment difficulties, and miniaturization limitations due to the materials used in light-shielding layers.
Innovation Solution
A method for manufacturing a sensing device that involves forming a light-shielding layer and an anti-reflection layer on a substrate, followed by patterning both layers using a single lithography process to create pinholes, which reduces alignment errors and enables miniaturization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If conventional light-shielding materials are used in pinhole arrays, then the structure can be formed, but light transmittance is low and alignment is difficult
Solution Approach 1:
The patent combines the light-shielding layer and anti-reflection layer into a single integrated structure that is patterned together in one lithography process. This merging eliminates the need for separate alignment steps between the two layers, solving the alignment precision problem while maintaining the optical benefits of both layers working together.
Solution Approach 2:
The patent uses a composite structure consisting of a light-shielding layer and an anti-reflection layer formed on top of it. This composite material approach allows the light-shielding layer to block unwanted light while the anti-reflection layer reduces reflected light, together improving light transmittance through the pinhole array.
2Length of moving object
If conventional pinhole structures are used, then light shielding is achieved, but miniaturization is difficult and alignment is problematic
Solution Approach 1:
The patent merges the patterning of the light-shielding layer and anti-reflection layer into a single lithography step. This allows pinholes to be miniaturized without compromising alignment precision, as both layers are defined by the same lithographic pattern, ensuring perfect registration even at small dimensions.
3Reliability
If separate lithography processes are used for light-shielding layer and anti-reflection layer, then each layer can be optimized, but alignment errors occur
Solution Approach 1:
The patent combines the patterning operations for both layers into a single lithography process, eliminating alignment errors between layers. The light-shielding layer and anti-reflection layer are patterned simultaneously using the same lithographic mask, ensuring perfect alignment while still allowing independent optimization of each layer's material properties and thickness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the anti-reflection effect in a specific wavelength range, improving the performance and reliability of the sensing device by minimizing reflectivity and facilitating the miniaturization of pinholes.
Implementation Method 1
forming a first anti-reflection layer on the sensing unit... enhances the anti-reflection effect in a specific wavelength range, improving the performance and reliability of the sensing device by minimizing reflectivity
Data Source
AI summary
A method for manufacturing a sensing device is provided. The method includes: providing a substrate; forming a sensing unit on the substrate; forming a first light-shielding layer on the sensing unit; forming a first anti-reflection layer on the sensing unit; and patterning the first light-shielding layer and the first anti-reflection layer using a single lithography process to form a first pinhole corresponding to the sensing unit.