Sensing Substrate Layout for Electrostatic Shielding in X-Ray Detectors

The conductive layer is segmented into multiple patterns (first conductive pattern and second conductive pattern) with different transparency characteristics. The first conductive pattern has higher transparency for light transmittance, while the second conductive pattern provides electrostatic shielding. This segmentation allows each pattern to specialize in one function, resolving the contradiction between light transmittance and electrostatic shielding capability.

Different regions of the conductive structure are assigned different quality characteristics. The first conductive pattern located at the light incident side uses transparent conductive material to maximize light transmittance locally, while the second conductive pattern at the back surface uses highly conductive material to provide strong electrostatic shielding locally. This local quality differentiation resolves the contradiction by optimizing each region for its specific function.

The conductive structure is divided into two separate patterns: the first conductive pattern made of transparent conductive material that maintains high light transmittance and photoelectric response sensitivity, and the second conductive pattern made of highly conductive material that provides strong electrostatic shielding. This segmentation allows both functions to coexist without compromising either light transmittance or electrostatic shielding capability.

The solution moves from a single-layer conductive structure to a multi-layer conductive structure with patterns at different depths and positions. The first conductive pattern is positioned to optimize light interaction, while the second conductive pattern is positioned to optimize electrostatic shielding. This dimensional arrangement resolves the contradiction by providing both functions simultaneously through spatial distribution.