Sensor Accuracy Maintenance via Cleaning Solution Contact
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Solution Overview
Problem
Industrial water systems, particularly cooling water systems, face challenges in maintaining accurate measurements due to deposition of minerals, fouling, and microbial contamination, which lead to measurement errors and instability.
Innovation Solution
The method involves contacting the wetted surfaces of pH and oxidation-reduction potential sensors with a cleaning solution, such as urea hydrogen chloride, and reintroducing the industrial water stream to assess and maintain sensor accuracy, with the option of introducing a gaseous stream at increased pressure to enhance cleaning, and comparing recovery curves to determine sensor degradation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If sensors are continuously exposed to industrial water stream, then measurement monitoring is maintained, but deposition forms on sensor surfaces causing measurement errors and instability
Solution Approach 1:
The system performs preliminary cleaning of sensor surfaces by introducing a cleaning solution before significant deposition occurs. The cleaning solution contacts the sensor wetted surfaces to prevent or remove scaling, fouling, and microbial contamination, thereby maintaining measurement accuracy without requiring sensor removal or shutdown of the industrial water system.
Solution Approach 2:
A cleaning solution acts as an intermediary substance between the industrial water stream and the sensor surfaces. This cleaning solution selectively removes deposits from the sensor wetted surfaces while being compatible with the sensor materials and the industrial water system operation, thus protecting the sensors without direct mechanical intervention.
2Object-affected harmful factors
If cleaning solution is applied to sensor surfaces, then deposition is removed, but sensor degradation occurs over time
Solution Approach 1:
The system monitors sensor performance by comparing recovery curves obtained from periodic cleaning cycles. When the comparison indicates acceptable sensor degradation, the sensor remains in service; when unacceptable degradation is detected, the sensor is removed from service. This feedback mechanism optimizes the cleaning frequency and intensity to balance deposit removal with sensor preservation.
Solution Approach 2:
The system adjusts cleaning parameters such as cleaning solution concentration, contact time, and flow rate based on sensor performance feedback. By dynamically changing these parameters, the system achieves effective cleaning while minimizing harsh chemical exposure that could accelerate sensor degradation, thus extending sensor lifespan.
3Object-affected harmful factors
If gaseous stream is introduced at increased pressure, then cleaning effectiveness is enhanced, but system complexity increases
Solution Approach 1:
The system introduces a gaseous stream at increased pressure (10-100 psi greater than industrial water stream pressure) into the industrial water stream after initiation of re-contacting. This pneumatic action enhances the mechanical removal of deposits from sensor surfaces and improves mixing of the cleaning solution, thereby boosting cleaning effectiveness without requiring complex mechanical cleaning mechanisms.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively prevents and removes deposition from sensor surfaces, maintaining measurement accuracy and extending sensor lifespan by identifying and replacing degraded sensors, thereby ensuring precise monitoring and control of industrial water systems.
Implementation Method 1
A cleaning solution comprising urea hydrogen chloride is contacted with at least one of the wetted surfaces for a first period of time and at a concentration sufficient to clean the at least one of the wetted surfaces
Implementation Method 2
A gaseous stream is introduced into the industrial water stream at a gaseous stream pressure of from about 10 psi to about 100 psi greater than the industrial water stream pressure
Data Source
Figure 1a~1b
Figure 1c
Figure 1d
AI summary
Methods of maintaining accuracy in the measurement of one or more parameters of industrial water in industrial water systems is disclosed. The methods comprise the use of physical and chemical means to prevent and/or remove deposition from one or more surfaces utilized in measurement of the one or more parameters. The deposition may be caused by, for example, corrosion, fouling, or microbiological growth.