Sensor Array Surface Treatment for Analyte Capture
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Solution Overview
Problem
Semiconductor processing techniques alter the surface chemistry of sensor arrays, leading to residue formation that hinders analyte capture and results in erroneous or absent signals in fields like genetic analysis.
Innovation Solution
A method involving a wash solution with an organic solvent and acid, such as sulfonic acid, followed by a basic solution and rinsing with low boiling organic solvents or water, is applied to treat sensor arrays to improve surface cleanliness and analyte capture.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If semiconductor processing techniques are used to manufacture sensor arrays, then the sensor arrays can be produced with precise structures and functions, but residues are formed on the surface that prevent analyte capture
Solution Approach 1:
The patent applies a multi-step surface treatment process (ozone treatment followed by plasma treatment) before the sensor array is used for analyte capture. This preliminary action removes processing residues and alters surface chemistry to create analyte-attracting properties, preventing the harmful effect of residue contamination before it can interfere with sensor function.
Solution Approach 2:
The patent changes the chemical and physical parameters of the sensor array surface through controlled treatment processes. Ozone treatment and plasma treatment modify surface energy, charge density, and chemical composition, transforming the surface from a residue-containing state to a clean, analyte-attracting state with optimized electrostatic properties.
2Productivity
If standard semiconductor processing is applied to sensor arrays, then manufacturing efficiency is maintained, but surface chemistry is altered in ways that reduce analyte capture effectiveness
Solution Approach 1:
The surface treatment process is integrated into the manufacturing workflow as a preliminary step before sensor deployment. By applying ozone and plasma treatments at this stage, the method ensures both high manufacturing efficiency and reliable analyte capture performance without requiring separate post-processing steps.
Solution Approach 2:
The patent optimizes surface parameters (surface energy, charge density, chemical composition) through controlled treatment conditions. By adjusting treatment time, power, and gas composition, the process achieves reliable analyte capture while maintaining manufacturing efficiency and scalability.
3Device complexity
If sensor arrays are used without surface treatment, then device complexity is minimized, but signals contain erroneous data or no data due to surface residues
Solution Approach 1:
The patent applies surface treatment as a preliminary step during device fabrication rather than as a complex post-processing operation. This approach improves measurement precision by ensuring clean surfaces before use, while keeping the overall device complexity manageable through integration into standard manufacturing workflows.
Solution Approach 2:
The treatment process modifies surface parameters to optimize analyte interaction without requiring complex device architecture changes. By controlling treatment parameters (ozone concentration, plasma power, treatment duration), the method achieves high signal accuracy with relatively simple processing steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This treatment enhances the loading and retention of analytes on sensor arrays, improving signal quality and signal-to-noise ratio, particularly in FET-based systems, and is effective for sequencing devices.
Implementation Method 1
applying a wash solution to the sensor array and rinsing the wash solution from the sensor array. The wash solution includes acid and an organic solvent
Implementation Method 2
The wash solution includes acid, such as a sulfonic acid, e.g., alkyl benzene sulfonic acid
Implementation Method 3
The wash solution includes an organic solvent. The sensor device can be further treated with a basic solution, such as a NaOH solution, or can be rinsed with a low boiling organic solvent or water
Implementation Method 4
The sensor device can be further treated with a basic solution, such as a NaOH solution
Data Source
AI summary
A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.