Sensor Calibration in a Darkroom for Consistent Plasma Light Measurement
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Solution Overview
Problem
Accurately controlling the thickness and density of plasma in semiconductor processing is challenging due to difficulties in determining these parameters through viewing ports, leading to inconsistencies in plasma formation during semiconductor processes.
Innovation Solution
A calibration apparatus is introduced that includes a housing with a darkroom space, a lighting unit emitting light in specific wavelengths, and a stage for a sensor device to ensure consistent light intensity across measurement positions, generating calibration data to adjust and equalize light intensities detected by the sensor device.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If plasma is observed through a viewing port to control thickness and density, then plasma formation can be monitored, but measurement accuracy deteriorates making it difficult to accurately determine plasma characteristics
Solution Approach 1:
The patent introduces an intermediary device (sensor device with optical detector) that indirectly measures plasma characteristics by detecting light emitted from plasma. This mediator converts plasma properties into measurable optical signals, resolving the difficulty of direct measurement through viewing ports while maintaining measurement accuracy.
Solution Approach 2:
The patent replaces the mechanical/optical approach of viewing port observation with an electronic detection system. The sensor device uses optical detectors and electronic signal processing to measure plasma characteristics, substituting the limited visual observation method with a more precise electronic measurement system.
2Adaptability or versatility
If sensor device measures light intensity at multiple measurement positions, then plasma characteristics can be comprehensively analyzed, but measurement consistency deteriorates due to variations in light intensity across different positions
Solution Approach 1:
The patent applies local quality by providing individual calibration for each measurement position. The calibration device adjusts light intensity independently at each position based on its specific characteristics, allowing the system to maintain measurement consistency across multiple positions while preserving the ability to comprehensively analyze plasma characteristics.
Solution Approach 2:
The patent changes the parameter of light intensity at each measurement position through calibration adjustments. By modifying the light intensity parameter individually for each position, the system achieves consistent measurements across all positions while maintaining the versatility of multi-position measurement capability.
3Measurement precision
If calibration data is generated to equalize light intensity across measurement positions, then measurement consistency improves, but device complexity increases due to additional calibration apparatus and procedures
Solution Approach 1:
The patent implements preliminary calibration action before actual plasma measurement. The calibration device pre-adjusts light intensity at each measurement position, so that when plasma measurement occurs, consistent readings are obtained without requiring complex real-time adjustments during the measurement process.
Solution Approach 2:
The calibration device is designed to be self-contained and automated, performing calibration operations independently without requiring extensive manual intervention. This self-service approach reduces operational complexity while achieving the goal of measurement consistency across multiple positions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution improves the accuracy of plasma characteristic analysis and enhances the yield of semiconductor processes by ensuring consistent plasma formation through calibrated sensor data, reducing variations in light detection across different measurement positions.
Implementation Method 1
a lighting unit installed in the darkroom space and configured to output light in a specific wavelength band
Implementation Method 2
a sensor device configured to detect intensity of light output by the lighting unit in at least one measurement position
Implementation Method 3
a plurality of optical members configured to guide light entering the plurality of measurement positions formed on the upper substrate
Data Source
AI summary
The present disclosure relates to calibration apparatuses of sensor devices. An example calibration apparatus of a sensor device includes a housing providing a darkroom space by blocking light from the outside, a lighting unit installed in the darkroom space and configured to output light in a specific wavelength band, a stage on which the sensor device, configured to detect intensity of light output by the lighting unit in at least one measurement position, is mounted, the stage installed below the lighting unit in the darkroom space, and a control device configured to receive raw data including intensity of light measured by the sensor device. The control device generates calibration data for adjusting intensity of light measured at the at least one measurement position.