Sensor Built-in Filter for Wafer Container Gas Detection
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Solution Overview
Problem
In semiconductor manufacturing, existing methods for maintaining the cleanliness of wafer accommodation containers face challenges in detecting the gas environment within the container without compromising maintenance performance, as external gas extraction is inefficient and internal detection mechanisms are prone to flooding during rinsing.
Innovation Solution
A sensor built-in filter structure is arranged in the flow path of the wafer accommodation container, featuring a first filter for dust removal, a second filter to block water while allowing gas passage, and a gas detection sensor between them, enabling efficient gas detection without flooding and maintaining container cleanliness during rinsing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a detection mechanism is provided inside the wafer accommodation chamber, then the degree of cleanliness can be detected in real-time, but the detection mechanism is flooded during rinsing and maintenance performance deteriorates
Solution Approach 1:
A filter structure is introduced as an intermediary component between the wafer accommodation chamber and the gas detection sensor. This filter allows gas to pass through to the sensor while blocking liquid water during rinsing operations, thereby protecting the sensor from flooding and maintaining both detection capability and maintenance performance
Solution Approach 2:
The system is segmented into distinct functional zones: the wafer accommodation chamber, the filter structure with dust-removing and water-blocking filters, and the gas detection sensor chamber. This segmentation isolates the sensor from direct exposure to water while maintaining gas detection capability
2Reliability
If gas is extracted from the accommodation container for detection, then the detection mechanism is protected from flooding, but the detection time increases and productivity decreases
Solution Approach 1:
The filter structure serves as a mediator that enables direct in-situ gas detection by allowing gas molecules to pass through to the sensor while blocking liquid water. This eliminates the need for time-consuming gas extraction and analysis, achieving both protection and rapid detection
Solution Approach 2:
The filter structure is pre-installed and configured before rinsing operations begin, establishing a protective barrier that automatically prevents water ingress during detection operations, eliminating the need for post-detection maintenance interruptions
3Measurement precision
If the sensor is exposed to the wafer accommodation chamber environment, then real-time detection is achieved, but dust from outside can flow into the chamber
Solution Approach 1:
The filter structure divides the system into a clean chamber side and a sensor side, with dust-removing filters positioned to prevent external dust from entering the wafer accommodation chamber while allowing gas detection to occur on the sensor side
Solution Approach 2:
Dust-removing filters act as intermediary components that capture external dust particles before they can reach the wafer accommodation chamber, while still permitting gas molecules to pass through to the detection sensor for real-time monitoring
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The sensor built-in filter structure allows for effective detection of gas components within the wafer accommodation chamber while preventing water ingress, ensuring maintenance performance and minimizing dust contamination, allowing for continuous rinsing with the sensor attached.
Implementation Method 1
a first filter removing dust contained in a gas
Implementation Method 2
a second filter arranged closer to the wafer accommodation chamber than to the first filter to block passage of water as a liquid and to allow the gas to pass
Data Source
AI summary
Provided is sensor built-in filter structure arranged in a wafer accommodation container, comprising: a first filter; a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas.