Sensor Substrate for Gas Flow Direction Measurement
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Solution Overview
Problem
Existing sensor wafers used in substrate processing apparatuses face challenges in accurately measuring gas flow directions and speeds due to limited sensor placement, which affects process uniformity and accuracy, as current sensors can only detect gas flow speeds in predetermined straight directions.
Innovation Solution
A sensor substrate with pairs of sensors positioned at different distances from the center, allowing vector data collection in multiple directions, enabling accurate gas flow direction measurement by combining data from first and second sensors set at specific angles, and using a transmission unit to wirelessly send data for calculation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If sensors are disposed in limited positions on the sensor substrate to avoid disrupting gas flow, then the gas flow measurement accuracy deteriorates, but the gas flow disturbance is reduced
Solution Approach 1:
The patent transitions from one-dimensional linear sensor arrays to two-dimensional matrix arrangements of sensors on the substrate surface. This dimensional expansion allows sensors to be distributed across multiple measurement regions simultaneously, capturing gas flow characteristics in both radial and tangential directions without requiring sensors to be positioned directly in the gas flow path, thereby maintaining measurement accuracy while minimizing flow disruption
Solution Approach 2:
The sensor substrate is divided into multiple measurement regions with sensors strategically positioned in each region. Instead of using a single dense array of sensors, the patent segments the measurement area and places sensors at representative positions in each segment, reducing overall sensor count and minimizing disruption to gas flow while maintaining comprehensive measurement coverage through data synthesis from multiple regions
2Adaptability or versatility
If the sensor substrate shape is kept similar to the wafer shape, then the adaptability to existing processing apparatus is improved, but the available positions for component disposal and sensor placement are limited
Solution Approach 1:
The sensor substrate is designed with a universal wafer-like shape that can be accommodated by existing processing apparatus, while simultaneously integrating multiple functions: gas flow sensing, data storage, and wireless communication. This multi-functional design eliminates the need for additional external components, resolving the conflict between shape compatibility and component placement flexibility
Solution Approach 2:
The patent merges previously separate components (sensors, memory, transmission unit) into a single integrated sensor substrate structure. By combining these elements on one substrate with a wafer-compatible shape, the invention maintains adaptability to existing apparatus while eliminating the complexity of managing multiple separate components and their individual mounting requirements
3Manufacturing precision
If sensors are positioned to minimize disruption to gas flow, then the measurement accuracy deteriorates, but the process uniformity is maintained
Solution Approach 1:
The patent implements a feedback mechanism where the sensor substrate continuously measures gas flow distribution and provides data to the control unit. The control unit uses this feedback information to adjust gas flow control valves in real-time, optimizing gas flow uniformity across the wafer surface. This closed-loop feedback system maintains process uniformity while enabling accurate measurement through properly positioned sensors
Data Source
AI summary
According to an embodiment of the present invention, a data obtainment method for obtaining data on gas flow directions in a plurality of measurement regions in a surface of a substrate loaded onto a loading unit of a substrate processing apparatus is provided. The method includes loading a sensor substrate onto the loading unit in a first direction, and changing the first direction into a second direction. Further, it is obtained a vector data of a gas flow in a first straight direction and a vector data of a gas flow in a second straight direction from each first sensor of the sensor substrate loaded in the first and second directions. Also, the method includes calculating a gas flow direction at each starting point in the first and second measurement regions by combining the vector data.