Separate Plasma Source Coil for Uniform Density Control
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Solution Overview
Problem
Existing plasma source coils lack structural stability and adjustment mechanisms to ensure uniform plasma density, particularly in semiconductor processes where finer line widths require precise control over tilting and height to prevent errors and non-uniformity.
Innovation Solution
A separate plasma source coil design featuring a center coil group and an edge coil group, both with adjustable tilting and height, allowing independent or simultaneous adjustment to maintain uniform plasma density, with the coils extending in a spiral shape and disposed on the same plane for precise control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single plasma source coil is used, then the structure is simple, but the plasma density uniformity deteriorates
Solution Approach 1:
The plasma source coil is divided into a center coil group and an edge coil group that can be independently adjusted. This segmentation allows separate optimization of plasma generation in different regions, improving overall plasma density uniformity while maintaining manageable structural complexity
Solution Approach 2:
The coil groups are made dynamically adjustable through independent height and tilting mechanisms. This enables real-time optimization of plasma density distribution by adjusting the position and orientation of each coil group according to process requirements
2Ease of manufacture
If the plasma source coil structure is fixed, then the manufacturing is simple, but the adaptability to tilting and height deviations deteriorates
Solution Approach 1:
The coil mounting structure incorporates adjustable mechanisms that allow the center and edge coil groups to be independently positioned and tilted. This dynamic capability enables compensation for alignment deviations while maintaining a relatively simple overall structure
Solution Approach 2:
The adjustment mechanism is segmented into independent control systems for each coil group, allowing flexible adaptation to different alignment requirements without requiring complex integrated adjustment systems
3Manufacturing precision
If the center coil group and edge coil group are independently adjustable, then the plasma uniformity control is improved, but the device complexity increases
Solution Approach 1:
The adjustment system is segmented into independent control mechanisms for the center and edge coil groups, allowing targeted optimization of plasma regions without requiring complex coordinated control of the entire coil system
Solution Approach 2:
Independent dynamic adjustment of each coil group enables precise control over plasma density distribution, with each group optimized for its specific region, achieving high uniformity without requiring overly complex integrated control
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enables precise correction of plasma uniformity issues, ensuring consistent semiconductor processing by allowing flexible and precise control over plasma generation, even as line widths become finer or more advanced.
Implementation Method 1
a plasma source coil is considered as a factor that affects the distribution of the plasma density
Data Source
AI summary
Provided is a separate plasma source coil and a method of controlling the same. The separate plasma source coil includes a center coil group disposed around a coil center and including one or more linear center coils, and an edge coil group disposed around the center coil group and including one or more linear edge coils.