Sequential Liquid-Phase Thin Films for Low-Temperature Battery Electrodes
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Solution Overview
Problem
Current deposition methods for conformal coatings on battery electrodes, such as traditional vapor phase atomic layer deposition (ALD), face challenges including high substrate temperatures, inefficient radiative heating, poor materials utilization, and internal resistance issues due to passivating layers, which limit the efficiency and practicality of battery performance.
Innovation Solution
A liquid-phase deposition method that uses a conveyance apparatus to transfer battery electrodes through reaction chambers with sequential liquid solutions, allowing for precise control of thin film thickness and conformality, avoiding high-temperature thermal evaporation and minimizing internal resistance by using solvation energy for reagent mobilization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional vapor phase ALD is used to deposit conformal coatings on battery electrodes, then film conformality and uniformity are improved, but substrate temperature must be maintained above 100°C (often >200°C) which degrades polymer binders and limits practical application
Solution Approach 1:
The patent changes the phase parameter of the deposition process from vapor phase to liquid phase. This allows the precursor to be delivered in liquid form at room temperature or lower, eliminating the need for high substrate temperatures that would degrade polymer binders while still achieving conformal coating through capillary action and surface diffusion in the liquid phase
Solution Approach 2:
The patent replaces the thermal evaporation mechanism with a liquid delivery mechanism. Instead of relying on thermal energy to evaporate precursors and deposit films, the system uses liquid precursor delivery followed by controlled evaporation or chemical reaction, substituting thermal field with liquid-phase mass transfer and chemical field
2Manufacturing precision
If traditional vapor phase ALD is used, then precise monolayer control is achieved, but materials utilization is poor due to continuous purge and evacuation of unused precursor
Solution Approach 1:
The patent changes the phase and delivery method of the precursor from vapor to liquid. Liquid precursors can be precisely metered and applied directly to the substrate surface, eliminating the need for continuous purge and evacuation cycles. This dramatically improves materials utilization while maintaining monolayer control through controlled liquid exposure and capillary action in porous structures
Solution Approach 2:
The liquid precursor system allows the substrate to actively absorb and retain the precursor through capillary action in its porous structure, rather than relying on vapor-phase adsorption followed by purge. The substrate essentially serves itself by capturing the liquid precursor where needed, reducing waste
3Manufacturing precision
If vapor phase ALD is used, then conformal coating is achieved, but the process is slow and costly due to sequential deposition cycles with vacuum and inert gas purges
Solution Approach 1:
The patent changes the phase of the deposition process from vapor to liquid, enabling simultaneous or near-simultaneous coating of entire substrate surfaces rather than sequential monolayer deposition. Liquid precursors can penetrate and coat porous structures rapidly through capillary action, eliminating the slow sequential vacuum-purge-deposition cycles of traditional ALD while maintaining conformality
Solution Approach 2:
The liquid-phase process enables continuous coating operation without the intermittent vacuum and purge steps required in vapor-phase ALD. The liquid precursor can be continuously delivered and reacted on the substrate surface, maintaining continuous useful deposition action and dramatically increasing productivity
4Reliability
If passivating layers are deposited to reduce SEI formation, then battery longevity is improved, but internal resistance increases due to electron transfer inhibition
Solution Approach 1:
The patent applies local quality by creating non-uniform coating thickness or composition - thinner or more porous regions at particle contact points to maintain electron transfer and lower internal resistance, while thicker protective regions in other areas to prevent SEI formation. This spatial variation in coating properties simultaneously addresses both longevity and resistance issues
Solution Approach 2:
The patent uses composite coating materials that combine protective functions with conductive properties. By depositing composite structures or multi-layer coatings with different functionalities, the system achieves both SEI protection and maintained electron transfer, reducing the harmful internal resistance effect while preserving battery longevity benefits
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables faster, more efficient, and cost-effective production of conformal thin films on battery electrodes, improving film uniformity and reducing internal resistance, thus enhancing battery performance and scalability.
Implementation Method 1
using solvation energy for reagent mobilization
Implementation Method 2
exposing the battery electrode to the first liquid solution to produce a partially coated battery electrode having a layer comprising an adsorbed first reagent on the surface
Data Source
AI summary
Methods, systems, and compositions for the liquid-phase deposition (LPD) of thin films. The thin films can be coated onto the surface of porous components of electrochemical devices, such as battery electrodes. Embodiments of the present disclosure achieve a faster, safer, and more cost-effective means for forming uniform, conformal layers on non-planar microstructures than known methods. In one aspect, the methods and systems involve exposing the component to be coated to different liquid reagents in sequential processing steps, with optional intervening rinsing and drying steps. Processing may occur in a single reaction chamber or multiple reaction chambers.


