Series Filter Layout for Microgel and Fine Particle Removal
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Solution Overview
Problem
Current filtering devices fail to achieve sufficient defect inhibition performance in chemical liquids used for semiconductor manufacturing, particularly due to inadequate removal of microgel and inorganic fine particles, which interact and cause defects during the lithography process.
Innovation Solution
A filtering device with a series arrangement of filters, including a filter with a porous polytetrafluoroethylene base material and a fluorinated ionomer coating, and another filter with a copolymer based on tetrafluoroethylene, is used to remove microgel and inorganic components effectively, employing both sieving and adsorption effects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single filter is used for purification, then the device complexity is low, but the defect inhibition performance is insufficient
Solution Approach 1:
The filtration system is divided into multiple independent filter units (first filter, second filter, third filter) arranged in series. Each filter has specific pore sizes and functional characteristics, allowing them to address different types of impurities separately. This segmentation enables high defect inhibition performance while maintaining manageable device complexity through modular design.
Solution Approach 2:
Each filter in the series is designed with specific local qualities - different pore sizes, different materials, and different positions in the flow path. The first filter has larger pores for microgel removal, while subsequent filters have progressively smaller pores for fine particle removal. This local differentiation optimizes overall purification effectiveness.
2Reliability
If multiple filters are arranged in series, then the defect inhibition performance improves, but the device complexity increases
Solution Approach 1:
Multiple filters with different functions are merged into a single series arrangement within one purification device. The first filter (microgel removal), second filter (fine particle removal), and third filter (polishing) are combined in sequence, allowing them to work together synergistically to achieve high defect inhibition performance without requiring separate processing stages.
Solution Approach 2:
The invention employs porous filtration materials with specifically controlled pore size distributions. The use of porous structures allows simultaneous achievement of high filtration efficiency and acceptable flow rates, reducing the need for excessively complex multi-stage systems while maintaining defect inhibition performance.
3Reliability
If conventional filters are used, then the manufacturing cost is low, but the ability to remove microgel and fine particles is insufficient
Solution Approach 1:
The filtration system uses composite material structures combining different porous materials with complementary properties. The first filter uses materials optimized for microgel entrapment, while subsequent filters use materials with progressively finer pore structures. This composite approach achieves superior purification effectiveness while using commercially available filtration materials that remain manufacturable.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device significantly improves defect inhibition performance by efficiently removing substances causing defects, leading to enhanced purity and reduced defects in the chemical liquids used in semiconductor manufacturing.
Implementation Method 1
a coating layer which is disposed to cover the porous base material and contains a fluorinated ionomer
Implementation Method 2
the filter A has a porous base material which is made of polytetrafluoroethylene
Data Source
AI summary
A filtering device is for obtaining a chemical liquid by purifying a liquid to be purified and has an inlet portion, an outlet portion, a filter A, a filter B different from the filter A, and a flow path extending from the inlet portion to the outlet portion, in which the filter A and the filter B are arranged in series between the inlet portion and the outlet portion and have, and the filter A is selected from the group consisting of predetermined filters A1, A2, and A3.