Sewing Data Creation Apparatus Bezier Curve Stitching

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Conventional embroidery data creation apparatuses require highly skilled operators to create smooth, balanced, and evenly arranged stippling stitches with decorative patterns using a sewing machine, as they cannot effectively transform profile lines into Bezier curves or arrange stitches evenly in a balanced manner, making it difficult for general operators and beginners to sew intricate designs.

Innovation Solution

A sewing data creation apparatus and program that includes a unit pattern storage device, pattern disposition device, and sewing data creation device to generate sewing data for forming stippling stitches with decorative patterns, using a unit pattern storage device to store pattern data, a pattern disposition device to determine the position of the unit pattern on a stitch path, and a sewing data creation device to create data for forming stitches on the stitch path and unit patterns at determined positions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a conventional embroidery data creation apparatus is used to create stippling stitches, then the stitch path can be generated, but the stitches cannot be arranged evenly and balanced, requiring highly skilled operators to manually adjust

Engineering Contradiction:

Improvestitch arrangement precisionVSAvoidoperator skill requirement

Core Design Contradiction:

Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent applies parameter changes by transforming the stitch path into a Bezier curve, which allows for smooth and balanced stitch arrangement. This mathematical transformation automatically adjusts the stitch parameters to achieve even distribution along the curve, eliminating the need for manual operator intervention and skill-based adjustments.

Inventive Principle:

Principle #35Parameter changes

2Shape

If a conventional embroidery data creation apparatus transforms profile lines into curves, then the curve shape is created, but the stitches cannot be arranged evenly in a balanced manner

Engineering Contradiction:

Improvecurve smoothnessVSAvoidstitch distribution uniformity

Core Design Contradiction:

ShapeVSManufacturing precision

Solution Approach 1:

The patent transforms the profile line into a Bezier curve using parameter changes, which simultaneously achieves both smooth curve shape and uniform stitch distribution. The Bezier curve mathematical model allows for controlled parameter adjustment that ensures stitches are evenly spaced along the curved path while maintaining the desired smooth shape.

Inventive Principle:

Principle #35Parameter changes

3Adaptability or versatility

If decorative patterns are added to stippling stitches, then the design complexity increases, but the difficulty of sewing increases significantly for general operators

Engineering Contradiction:

Improvedesign complexityVSAvoidsewing difficulty

Core Design Contradiction:

Adaptability or versatilityVSEase of operation

Solution Approach 1:

The patent applies segmentation by dividing the complex decorative pattern into unit patterns that are automatically disposed at predetermined intervals along the stitch path. This segmentation allows the sewing machine to handle complex designs through automated pattern repetition and positioning, significantly reducing the skill level required while maintaining high design complexity and versatility.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The patent uses copying by automatically reproducing unit patterns at predetermined intervals along the stitch path. Instead of requiring operators to manually create and position each decorative element, the system copies the unit pattern multiple times along the curve, ensuring uniform spacing and consistent appearance, which makes complex decorative designs accessible to general operators.

Inventive Principle:

Principle #26Copying

4Manufacturing precision

If the stitch path has intersections or uneven density, then the sewing process becomes complicated, but the aesthetic quality of the stippling stitch decreases

Engineering Contradiction:

Improvestitch line qualityVSAvoidstitch path complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent uses parameter changes through Bezier curve transformation to eliminate intersections and achieve uniform stitch density. The mathematical properties of Bezier curves ensure that the transformed stitch path maintains consistent spacing between stitches and avoids self-intersections, thereby improving aesthetic quality while reducing stitch path complexity.

Inventive Principle:

Principle #35Parameter changes

Data Source

PatentUS7814851B2Sewing data creation apparatus and computer-readable recording medium storing a sewing data creation program

Publication Date: 2010.10.19 BROTHER KOGYO KK

AI summary

A sewing data creation apparatus for creating sewing data required for sewing by a sewing machine may include a unit pattern storage device to store pattern data of a unit pattern of a predetermined design. The apparatus may further include a pattern disposition device that determines a position of the unit pattern stored in the unit pattern storage device on a stitch path, the stitch path including a curve-like portion. Also, the apparatus may include a sewing data creation device that creates the sewing data for forming stitches on the stitch path and stitches of the unit pattern at the position determined by the pattern disposition device.