Sewing Data Processing for IC Tag Integration in Applique Patterns

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Solution Overview

Problem

Existing sewing technologies face challenges in attaching an IC tag to a work cloth without damaging its design, as directly sewing a mark can affect the appearance and limit the amount of information that can be stored.

Innovation Solution

A sewing data processing apparatus that determines and sets the position of an IC tag area within an applique pattern area on a sewing machine, ensuring the IC tag is integrated into the design without compromising the cloth's appearance, using an IC tag area acquisition device, determination device, and location setting device.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a mark is directly sewn to the work cloth, then the mark is securely attached and protected from deformation, but the appearance and design of the work cloth is badly affected

Engineering Contradiction:
Improvemark attachment securityVSAvoidwork cloth appearance
Core Design Contradiction:
ReliabilityVSShape

Solution Approach 1:

The mark is nested within the applique pattern area, which itself is sewn onto the work cloth. This allows the mark to be securely attached through the applique construction while remaining visually integrated into the design, thus maintaining both attachment security and aesthetic appearance

Inventive Principle:
Principle #7Nested doll (Nesting)

Solution Approach 2:

The applique pattern serves as an intermediary element between the mark and the work cloth. Instead of directly sewing the mark to the work cloth, the mark is positioned within the applique area, which then gets sewn onto the work cloth, mediating the attachment process to preserve appearance

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If a mark is directly sewn to the work cloth, then the mark is securely attached, but the amount of information that can be stored is insufficient

Engineering Contradiction:
Improvemark attachment securityVSAvoidinformation storage capacity
Core Design Contradiction:
ReliabilityVSLoss of information

Solution Approach 1:

An IC tag is introduced as an intermediary information storage device that is attached to the work cloth (preferably within or near the applique area). This IC tag can store large amounts of information digitally, replacing the limited information capacity of traditional visual marks while maintaining secure attachment through the same applique construction

Inventive Principle:
Principle #24Intermediary (Mediator)

3Loss of information

If an IC tag is attached to the work cloth, then large amounts of information can be stored, but the design of the work cloth may be damaged

Engineering Contradiction:
Improveinformation storage capacityVSAvoidwork cloth design
Core Design Contradiction:
Loss of informationVSShape

Solution Approach 1:

The IC tag is positioned within or near the applique pattern area, which acts as a mediator that integrates the electronic component into the overall design. The applique construction provides a natural location for the IC tag that is both functional and aesthetically acceptable

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The IC tag is strategically positioned in a specific local area (within the applique pattern area) rather than being randomly placed. This localized positioning ensures that the information storage function is achieved while the tag remains concealed or integrated into the design elements

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS8061287B2Sewing data processing apparatus, sewing machine equipped with sewing data processing apparatus, and computer-readable recording medium with recorded sewing data processing computer program
Publication Date: 2011.11.22 BROTHER KOGYO KK
  • US8061287B2 patent drawing
  • US8061287B2 patent drawing
  • US8061287B2 patent drawing

AI summary

A sewing data processing apparatus which may be used to attach an IC tag to a work cloth without impairing a design of the work cloth. The processing apparatus may acquire an IC tag area on the basis of a size and shape of the IC tag and subsequently may determine whether the IC tag area can be included in an applique pattern area which is determined on the basis of applique pattern data. If the IC tag area can be included in the applique pattern area, positions of the applique pattern area and the IC tag area may be set in such a manner that the IC tag area is positioned in the applique pattern area.