Sewing Data Generation Device Outline Offset Strategy
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Solution Overview
Problem
Existing sewing data generation devices do not adequately consider sewing data for outlines set outside the contour line of an embroidery pattern, leading to potential misalignment and unintended recesses in the sewing process.
Innovation Solution
A non-transitory computer-readable medium and sewing data generation device that acquire pattern data to set an outline with an offset portion and a complementary portion, where the offset portion is offset from the contour by a predetermined amount and the complementary portion is offset by a larger amount, generating sewing data to sew the outline outside the embroidery pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If an outline is set at a constant offset distance from the contour line of an embroidery pattern, then the sewing process is simple and efficient, but unintended recesses and misalignment occur at concave portions of the pattern
Solution Approach 1:
The patent applies local quality by differentiating the offset distance based on the local geometry of the contour line. At convex portions, the outline uses a first offset distance, while at concave portions, it uses a second offset distance that is smaller than the first. This local differentiation prevents unintended recesses at concave portions while maintaining the desired outline at convex portions, thereby resolving the contradiction between sewing efficiency and outline alignment precision.
2Manufacturing precision
If an outline is set to follow the contour line exactly, then alignment precision is maintained, but the sewing process becomes complex and time-consuming
Solution Approach 1:
The patent changes the offset distance parameter dynamically based on the local characteristics of the contour line. Instead of using a fixed offset distance, the system adjusts the offset distance between a first value (at convex portions) and a second value (at concave portions, where the second value is smaller). This parameter change allows the outline to maintain good alignment with the contour line while avoiding the complexity of exactly following the contour, thus resolving the contradiction between alignment precision and sewing efficiency.
Data Source
AI summary
A non-transitory computer-readable medium stores computer-readable instructions. The instructions, when executed, cause a processor of a sewing data generation device configured to generate sewing data to perform processes. The processes include acquiring pattern data to sew an embroidery pattern. The processes further include setting an outline having an offset portion and a complementary portion on the basis of the pattern data. The outline is a single line surrounding the outside of a contour of the embroidery pattern. The offset portion is a part of the single line and is offset from the contour toward the outside of the embroidery pattern by a predetermined amount. The complementary portion is another part of the single line and being offset from the contour toward the outside of the embroidery pattern by an amount larger than the predetermined amount. The processes also include generating sewing data to sew the outline.