Sewing Data Generation for Stippling Pattern Alignment
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Solution Overview
Problem
Existing sewing data creation devices struggle when sewing stippling patterns over areas larger than the embroidery frame, as they divide stitch paths, making it difficult to align end portions of divided stitches, resulting in an unnatural embroidery finish.
Innovation Solution
A sewing data generation system that acquires a target area and generates multiple sewing data sets for stippling patterns, ensuring each stitch path is contained within the sewing area, with adjacent paths having convex portions aligned in the same direction, and associates this data with arrangement information for precise stitching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the stitch path is divided to fit within the sewing area, then the pattern can be sewn over areas larger than the embroidery frame, but it becomes difficult to align positions of end portions of the divided stitches resulting in an unnatural embroidery finish
Solution Approach 1:
The patent divides the target area into multiple sub-areas and generates separate sewing data for each sub-area. Each sub-area contains a complete stitch path that fits within the sewing area boundaries. This segmentation allows the system to handle patterns larger than the embroidery frame while maintaining alignment quality at division boundaries.
Solution Approach 2:
The patent performs preliminary processing to identify and mark convex portions on stitch paths before dividing the target area. By pre-positioning these convex portions at strategic locations, the system ensures that when stitch paths are divided and reassembled, the end portions align naturally along the convex portion positions, creating a seamless embroidery finish.
2Area of stationary object
If the stitch path is set to cover the entire target area, then the pattern coverage is complete, but the stitch path exceeds the sewing area making it impossible to sew
Solution Approach 1:
The patent segments the target area into multiple sub-areas, each containing a portion of the complete stitch path. This allows the overall pattern coverage to span the entire target area while each individual sewing operation remains within the physical sewing area limits of the embroidery frame.
Solution Approach 2:
The patent introduces a temporal dimension by sequencing multiple sewing operations. Instead of attempting to sew the entire stitch path in one continuous motion, the system divides the stitching process into multiple passes, each handling a segment of the overall pattern. The arrangement information coordinates these sequential operations to reconstruct the complete design.
3Area of stationary object
If multiple sewing data are generated to cover large areas, then the pattern can be sewn across the entire target area, but the complexity of managing and aligning multiple data sets increases
Solution Approach 1:
The patent introduces arrangement information as an intermediary data structure that manages the relationship between multiple sewing data sets. This intermediary contains position information for each sub-area and identifies convex portion locations, enabling automatic alignment and assembly of the divided stitch paths without requiring complex manual intervention.
Solution Approach 2:
The patent transforms the complex alignment problem into a simpler parameter-matching task by standardizing the convex portion positions across all sub-areas. By ensuring that convex portions are positioned at identical coordinates in corresponding locations of adjacent sub-areas, the system reduces the alignment complexity to a straightforward parameter comparison and matching operation.
Data Source
AI summary
A non-transitory computer-readable medium storing computer-readable instructions. The instructions, when executed, cause a processor of a sewing data generation device configured to generate sewing data to perform steps. The steps include acquiring a sewing area in which a pattern is to be sewn and acquiring a target area in which a pattern is to be arranged. The steps further include generating a plurality of sewing data. Each of the plurality of sewing data is data to form stitches of a plurality of stippling patterns inside the acquired target area. The steps further include associating the sewing data with arrangement information, for each of the plurality of sewing data, and outputting the sewing data and arrangement information that have been associated with each other. The arrangement information indicates an arrangement of each of the stippling patterns to be sewn on the basis of the sewing data.