Shape Calculation Device for Periodic Structures Using Scattering Profile Fitting
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Solution Overview
Problem
The small angle scattering X-ray method for analyzing periodic structures on substrates faces challenges in achieving sufficient measurement accuracy due to the complexity of fitting huge waveform data.
Innovation Solution
A shape calculation system and device that create data frames from scattering profiles obtained through actual and simulated measurements, identify factors of interest, and perform fitting to determine the shape of periodic structures on substrates with high accuracy by focusing on sensitive parameters.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the small angle scattering X-ray method is used to analyze periodic structures, then measurement capability is provided, but measurement accuracy is insufficient due to the complexity of fitting huge waveform data
Solution Approach 1:
The patent extracts and identifies only the critical factors from the scattering profile that have high contribution ratios to shape parameters, rather than analyzing the entire huge waveform data. This extraction process removes unnecessary data elements, reducing fitting complexity while maintaining measurement accuracy.
Solution Approach 2:
The patent creates simulated scattering profiles that copy the characteristics of actual measurement profiles. By comparing actual and simulated profiles, the system identifies critical factors without needing to fit all the original huge waveform data, thereby simplifying the analysis while preserving measurement capability.
2Productivity
If all factors in the scattering profile are analyzed for shape determination, then comprehensive measurement is achieved, but processing time increases and throughput decreases
Solution Approach 1:
The patent extracts only the critical factors from the scattering profile that significantly contribute to shape parameter determination. By removing redundant factors from analysis, the processing time is reduced while maintaining comprehensive measurement capability for all relevant shape parameters.
Solution Approach 2:
The patent performs partial analysis by focusing only on the necessary subset of factors rather than analyzing all factors in the scattering profile. This partial action approach achieves sufficient measurement accuracy with reduced processing time, improving overall productivity.
3Measurement precision
If selective analysis of sensitive factors is performed, then measurement accuracy is improved and throughput increases, but the complexity of identifying critical factors increases
Solution Approach 1:
The patent uses feedback from simulated scattering profiles to identify critical factors. By comparing simulated and actual profiles and analyzing contribution ratios, the system automatically determines which factors are critical, reducing the complexity of manual identification while improving measurement accuracy.
Solution Approach 2:
The patent performs preliminary simulation and analysis to identify critical factors before actual measurement and fitting. This preliminary action establishes the basis for selective analysis, reducing the complexity during the actual measurement process while ensuring high accuracy.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the accuracy of shape calculation for periodic structures by selectively analyzing sensitive factors, improving measurement throughput and ensuring precise determination of shape parameters like hole depth, rounding radii, and other critical features.
Implementation Method 1
a first scattering profile obtained by irradiating a first structure on a substrate with an electromagnetic wave
Implementation Method 2
the small angle scattering X-ray method requires fitting of huge waveform data
Data Source
AI summary
According to one embodiment, a recording medium records a shape calculation program causing a computer to execute creating a first data frame which is a set of first factors corresponding to a shape to be measured from a first scattering profile obtained by irradiating a first structure on a substrate with an electromagnetic wave, creating a second data frame corresponding to the first data frame from a second scattering profile calculated based on a second structure, the second structure being a structure simulated, fitting the first data frame and the second data frame, and determining the shape of the first structure based on the fitting result.