Shaping Aperture Array for Beam Diameter Change Without Axis Shift
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Solution Overview
Problem
Existing charged particle beam apparatuses face challenges in efficiently adjusting the beam diameter for various pattern sizes, leading to increased inspection and drawing times due to the need for time-consuming optical axis adjustments.
Innovation Solution
The use of a shaping aperture array comprising a first membrane with a first aperture and a second membrane with a second aperture, where the second aperture overlaps the first aperture to form a third aperture, allowing for adjustable beam diameter by moving the membranes in opposite directions without shifting the optical axis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the beam diameter is adjusted by changing the aperture size, then the beam diameter can be changed to match different pattern sizes, but the optical axis shifts requiring time-consuming adjustments
Solution Approach 1:
The aperture is divided into two separate membranes (first membrane and second membrane), each with its own aperture. This segmentation allows independent control of each membrane's position, enabling beam diameter adjustment without optical axis shift. The first membrane and second membrane can be moved separately to create the combined aperture effect while maintaining optical axis stability.
Solution Approach 2:
The second membrane acts as an intermediary element between the beam and the final aperture configuration. By moving the second membrane relative to the first membrane, the effective aperture size is adjusted without requiring movement of the optical axis. This intermediary mechanism decouples the beam diameter control from optical axis positioning.
2Ease of operation
If a single aperture is used for beam shaping, then the structure is simple, but the beam diameter cannot be adjusted without shifting the optical axis
Solution Approach 1:
The single aperture is segmented into two separate apertures on two different membranes. While this increases structural complexity, it enables independent control of each aperture's position, allowing beam diameter adjustment without optical axis shift. The segmented structure provides operational flexibility that compensates for the increased complexity.
Solution Approach 2:
The aperture structure is made dynamic by allowing the second membrane to move relative to the first membrane. This dynamic configuration enables continuous adjustment of the effective aperture size without static reconfiguration or optical axis movement. The movable second membrane creates a dynamic aperture system that adapts to different beam diameter requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables rapid adjustment of the electron beam diameter, reducing the time required for optical axis adjustments and optimizing inspection and drawing times by allowing for beam diameter changes according to the pattern size.
Implementation Method 1
the electron beam emitted from an electron gun is passed through the shaping aperture and multi-beams are formed
Data Source
AI summary
A charged particle beam pattern forming device is described, a charged particle beam passing through a third aperture for forming a charged particle beam pattern, the charged particle beam pattern forming device including: a first element including a first aperture, a second element including a second aperture, the second aperture overlapping the first aperture, wherein the third aperture is defined by an overlap of the first aperture and the second aperture, and a shape of the third aperture is capable of being changed by a driver such that the first element is moved in a first direction and the second element is moved in a second direction opposite to the first direction.