Shared Barrier Layer RDL and Via Structure for Multi-Die Packaging
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Solution Overview
Problem
As integrated circuit packages become increasingly complex, with multiple device dies packaged together to achieve more functions, there is a need for efficient methods to connect and bond these dies while maintaining optimal performance and reducing manufacturing costs.
Innovation Solution
The solution involves a method of manufacturing a package structure that includes bonding multiple dies together using hybrid bonding techniques, forming through dielectric vias and redistribution layers to facilitate electrical connections, and using dielectric and conductive materials to create a robust and efficient interconnect system.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple device dies are packaged together to achieve more functions, then device functionality and performance are improved, but package complexity increases
Solution Approach 1:
The package structure is divided into multiple device dies (first device die, second device die) that can be independently manufactured and then bonded together. Each die can be optimized for specific functions, allowing complex functionality to be achieved through modular assembly rather than a single complex chip.
Solution Approach 2:
Multiple device dies are nested within a single package structure, with each die containing its own internal architecture while being integrated into the larger system. The through dielectric via and redistribution layer structure allows nested interconnection between different die levels.
2Reliability
If hybrid bonding techniques are used to bond multiple dies, then connectivity and performance are improved, but manufacturing process complexity increases
Solution Approach 1:
The barrier layer is formed on the through dielectric via before the conductive layer is deposited, preparing the surface in advance for optimal adhesion and electrical properties. This preliminary barrier layer formation simplifies the overall manufacturing process by preventing defects that would require rework.
Solution Approach 2:
The through dielectric via structure serves multiple functions: it provides mechanical support, electrical connection, and a platform for the barrier and conductive layers. This multi-functional design reduces the need for separate structures, simplifying the manufacturing process while maintaining high connectivity.
3Productivity
If through dielectric vias and redistribution layers are formed, then electrical connection efficiency is improved, but manufacturing steps increase
Solution Approach 1:
The formation of the through dielectric via, barrier layer, and conductive layer is combined into a single integrated structure. The via penetrates through the dielectric substrate and is immediately followed by conformal barrier and conductive layer deposition, creating a unified interconnection element that reduces the number of separate manufacturing steps.
Solution Approach 2:
The barrier layer acts as an intermediary between the dielectric via and the conductive layer, providing a transition interface that ensures proper adhesion and electrical properties. This intermediary layer enables the efficient formation of the complete interconnection structure in a streamlined process.
Data Source
AI summary
A package structure includes first and second dies, an insulation structure, a through via, a dielectric layer and a redistribution layer. The second die electrically bonded to the first die includes a through substrate via. The insulation structure is disposed on the first die and laterally surrounds the second die. The through via penetrates through the insulation structure to electrically connect to the first die. The dielectric layer is disposed on the second die and the insulation structure. The redistribution layer is embedded in the dielectric layer and electrically connected to the through via. The redistribution layer includes a first barrier layer and a conductive layer on the first barrier layer. The through substrate via is electrically connected to the redistribution layer, and the conductive layer is in contact with a conductive post of the through via and separated from the through substrate via by the first barrier layer therebetween.


