Shared Gas-Exhaust Control for Substrate Chamber Pressure Stability

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Solution Overview

Problem

The substrate processing apparatus experiences a decrease in work rate due to abnormal gas-exhaust pressure in chambers when the damper opening reaches its upper limit, especially under reduced force conditions, leading to chamber pressure abnormalities and apparatus shutdown.

Innovation Solution

A management system and method that utilizes a management device to analyze processing information from multiple substrate processing units sharing a gas-exhaust path, generating correlations to predict abnormalities by comparing actual gas-exhaust states with normal operating conditions, using a model generator and detector to identify deviations and prevent work rate reductions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If multiple substrate processing units share a common gas-exhaust path, then device complexity is reduced, but gas-exhaust pressure control becomes difficult leading to abnormalities

Engineering Contradiction:
Improvegas-exhaust path configurationVSAvoidgas-exhaust pressure control
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent segments the common gas-exhaust path into multiple controlled zones by introducing individual dampers for each substrate processing unit. This allows independent control of gas-exhaust flow from each unit while sharing the common path, resolving the contradiction between simplified configuration and reliable pressure control.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent implements feedback control by monitoring gas-exhaust pressure from each substrate processing unit and dynamically adjusting the corresponding damper opening. This closed-loop control ensures stable pressure maintenance despite shared exhaust path constraints, preventing abnormalities while maintaining system simplicity.

Inventive Principle:
Principle #23Feedback

2Reliability

If damper opening is increased to maintain gas-exhaust pressure, then pressure control improves, but work rate decreases due to frequent abnormalities

Engineering Contradiction:
Improvechamber pressure stabilityVSAvoidwork rate
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent performs preliminary detection of abnormal trends by analyzing gas-exhaust pressure patterns before they develop into critical abnormalities. This early warning system allows preventive adjustments to damper openings, maintaining pressure stability without triggering shutdowns that would reduce work rate.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent employs dynamic damper control that adjusts openings in real-time based on actual gas-exhaust pressure conditions rather than fixed positions. This dynamic adjustment optimizes the balance between maintaining adequate pressure and avoiding excessive opening that would trigger abnormalities, thereby preserving work rate.

Inventive Principle:
Principle #15Dynamics

3Power

If damper opening reaches upper limit, then maximum gas-exhaust capacity is achieved, but pressure control fails under reduced force conditions

Engineering Contradiction:
Improvegas-exhaust capacityVSAvoidpressure control capability
Core Design Contradiction:
PowerVSReliability

Solution Approach 1:

The patent changes the control parameter from fixed damper opening positions to continuously variable opening degrees based on real-time pressure feedback. This allows the system to optimize the opening degree for each operational condition, achieving adequate gas-exhaust capacity while maintaining reliable pressure control even when exhaust force is reduced.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20260011585A1Substrate processing apparatus management system, management device, substrate processing apparatus, substrate processing apparatus management method and non-transitory computer-readable medium storing substrate processing apparatus management program
Publication Date: 2026.01.08 SCREEN HOLDINGS CO LTD
  • US20260011585A1 patent drawing
  • US20260011585A1 patent drawing
  • US20260011585A1 patent drawing

AI summary

A substrate processing apparatus includes a gas-exhaust path to which a predetermined exhaust force is applied, and a plurality of substrate processing units configured to share the gas-exhaust path. Group correlations are predetermined as correlations in regard to a plurality of processing information pieces which correspond to each of the plurality of substrate processing units and represent work or a state relating to supply and exhaust of gas, and a management device that manages the substrate processing apparatus acquires a plurality of processing information pieces corresponding to each of the plurality of substrate processing units, and detects a state prior to a state in which the plurality of substrate processing apparatuses become abnormal, based on comparison information obtained when correlations in regard to a plurality of processing information pieces relating to exhaust of gas among a plurality of processing information pieces are compared with the group correlations.