Shared Gas Box Layout for Parallel Substrate Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional substrate processing apparatuses require multiple gas boxes for each processing chamber, leading to increased cost and space requirements, while reducing the number of gas boxes compromises the ability to perform different gas processes in parallel.
Innovation Solution
A substrate processing apparatus with a reduced number of gas boxes supplies processing gases to multiple chambers through tank units and a centralized gas supply module, utilizing a controller to manage gas flow and pressure for each chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple gas boxes are installed for each processing chamber, then the ability to perform different gas processes in parallel is maintained, but installation cost and space requirements increase
Solution Approach 1:
The patent combines multiple gas supply functions into a single shared gas box that serves multiple processing chambers. The gas box includes multiple gas supply lines that can be selectively connected to different chambers, allowing one gas box to replace what would traditionally require multiple separate gas boxes. This merging reduces installation space while maintaining the capability to supply different processing gases to different chambers simultaneously.
Solution Approach 2:
The gas box is designed with multi-functionality to supply different types of processing gases to multiple different processing chambers. It includes multiple gas supply lines with selective connection capabilities, allowing the same gas box structure to serve various chambers with different gas requirements. This universal design enables the system to perform different gas processes in parallel without requiring dedicated gas boxes for each chamber.
2Reliability
If multiple gas boxes are installed for each processing chamber, then gas supply reliability is maintained, but installation cost increases
Solution Approach 1:
The patent merges multiple gas supply systems into a single integrated gas box structure that serves multiple processing chambers. This consolidation reduces the total number of components that need to be manufactured and installed, thereby reducing installation cost. The design maintains reliability through selective connection mechanisms that ensure each chamber receives the appropriate gas supply without cross-contamination or interference.
Solution Approach 2:
The gas box is designed as a universal supply unit that can serve multiple chambers with different gas requirements. This multi-functional design reduces manufacturing complexity and installation cost compared to having dedicated gas boxes for each chamber, while maintaining gas supply reliability through selective activation and isolation mechanisms.
3Area of stationary object
If the number of gas boxes is reduced, then installation cost and space are reduced, but the ability to perform different gas processes in parallel is compromised
Solution Approach 1:
The patent merges multiple gas supply functions into a single gas box with selective connection capabilities. The gas box includes multiple supply lines that can be independently activated and connected to different processing chambers as needed. This merging allows the system to maintain parallel gas process capabilities while using fewer physical gas box units, thereby reducing installation space.
Solution Approach 2:
The gas box incorporates dynamic selective connection mechanisms that allow the system to adaptively configure gas supply paths. Valves and connection mechanisms enable the gas box to dynamically switch which chambers receive which gases, maintaining versatility and the ability to perform different gas processes in parallel despite having a reduced number of gas boxes.
4Ease of manufacture
If the number of gas boxes is reduced, then installation cost is reduced, but gas flow control complexity increases
Solution Approach 1:
The patent merges multiple gas supply control functions into a single gas box with integrated flow control mechanisms. While this reduces installation cost by using fewer separate gas boxes, it does concentrate control complexity within the gas box structure. The gas box includes multiple supply lines with selective valves and flow control elements that can be activated based on which chambers require gas supply at any given time.
Solution Approach 2:
The gas box incorporates feedback mechanisms that monitor gas flow and chamber status to automatically control which supply lines are activated. This feedback-based control system manages the complexity of gas flow distribution by using sensors and control logic to determine when and where to supply gases, reducing the need for complex manual control while maintaining proper gas flow management.
Data Source
AI summary
A processing apparatus which processes a substrate is disclosed. The processing apparatus comprises: a plurality of processing chambers which process the substrate in an atmosphere of a desired processing gases; a plurality of tank units provided for each of the plurality of processing chambers, the plurality of tank units including a plurality of tanks configured for temporarily storing the processing gases; and one or more gas boxes supplying the processing gases to the processing chambers via the tank units. The substrate processing apparatus allows the number of gas boxes to be reduced.