Shared Plate Planar Capacitors for Dense Memory Integration

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Integrating capacitors, including ferroelectric or paraelectric materials, on the same plane as interconnects of logic devices is challenging due to spacing issues and difficulties in connecting transistors and routing interconnects, limiting charge storage and device operation.

Innovation Solution

A shared plate electrode structure is used to couple multiple capacitors to a single transistor, with flexible shape and size adjustments, and a dual hydrogen barrier to protect against hydrogen diffusion, ensuring efficient integration and performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If capacitors are integrated on the same plane as interconnects of logic devices, then charge storage capability is improved, but spacing between capacitors becomes constrained and routing interconnects becomes difficult

Engineering Contradiction:
Improvecharge storage capabilityVSAvoidspacing between capacitors
Core Design Contradiction:
Quantity of substanceVSArea of stationary object

Solution Approach 1:

The patent transitions from planar capacitor integration to three-dimensional vertical stacking. Multiple capacitor layers are stacked above the substrate, with shared plate electrodes extending vertically to connect multiple capacitor layers. This dimensional change allows increased charge storage capacity without constraining the horizontal spacing between capacitors, as capacitors are arranged in the vertical dimension rather than competing for planar space.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If capacitor spacing is scaled down to increase density, then device integration density is improved, but connections between transistors and routing interconnects become challenging

Engineering Contradiction:
Improvedevice integration densityVSAvoidconnections between transistors and routing interconnects
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent merges multiple capacitor structures by implementing shared plate electrodes that are commonly shared among multiple capacitors. The plate electrode structure extends vertically to serve as a common connection point for multiple capacitors, reducing the number of separate interconnect routes needed. This merging approach maintains high integration density while simplifying the connection network between transistors and capacitors.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

By moving to vertical stacking with plate electrodes extending in the vertical dimension, the patent reduces horizontal routing complexity. The shared plate electrodes provide vertical access to multiple capacitors, eliminating the need for complex horizontal interconnect routing that would be required to connect closely-spaced planar capacitors to transistors.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Quantity of substance

If multiple capacitors are coupled to increase charge storage, then memory capacity is improved, but the number of interconnects and transistors required increases device complexity

Engineering Contradiction:
Improvememory capacityVSAvoidnumber of interconnects and transistors
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent combines multiple capacitors into a unified vertical stack that shares common plate electrodes and can be controlled by shared transistor connections. This merging allows multiple capacitors to function as an integrated memory unit, increasing memory capacity without proportionally increasing the number of transistors and interconnects required, as the shared structure reduces redundant connection elements.

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS12376312B1Methods of fabricating planar capacitors on a shared plate electrode
Publication Date: 2025.07.29 KEPLER COMPUTING INC
  • US12376312B1 patent drawing
  • US12376312B1 patent drawing
  • US12376312B1 patent drawing

AI summary

A device structure comprises a first conductive interconnect, an electrode structure on the first conductive interconnect, an etch stop layer laterally surrounding the electrode structure; a plurality of memory devices above the electrode structure, where individual ones of the plurality of memory devices comprise a dielectric layer comprising a perovskite material. The device structure further comprises a plate electrode coupled between the plurality of memory devices and the electrode structure, where the plate electrode is in direct contact with a respective lower most conductive layer of the individual ones of the plurality of memory devices. The device structure further includes an insulative hydrogen barrier layer on at least a sidewall of the individual ones of the plurality of memory devices; and a plurality of via electrodes, wherein individual ones of the plurality of via electrodes are on a respective one of the individual ones of the plurality of memory devices.