Shared Wafer Handling Layout for Compact Wet-Dry Lithography
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Solution Overview
Problem
Existing substrate processing systems require significant space due to separate wet and dry processing systems for photolithography, which occupy large areas for both resist film formation and development processes.
Innovation Solution
A substrate processing system that integrates wet and dry processing systems with a common stage for substrate accommodation and separate transfer systems, allowing for the transfer of substrates between these systems, enabling both wet and dry processes to be performed in a compact space.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If separate wet and dry processing systems are used for photolithography, then both wet and dry processes can be performed independently, but the system occupies large area
Solution Approach 1:
The patent combines wet and dry processing systems into a single integrated substrate processing system. The shared stage and transfer mechanism allow both wet and dry processing chambers to access the same substrate handling infrastructure, reducing the overall system footprint while maintaining independent process capabilities.
Solution Approach 2:
The stage and transfer mechanism are designed to be universal, serving both wet and dry processing systems. The stage can accommodate substrates for either wet or dry processing, and the transfer mechanism can move substrates to and from both types of processing chambers, eliminating the need for separate handling systems.
2Reliability
If separate transfer systems are used for wet and dry processing, then substrate transfer between systems is reliable, but the system complexity increases
Solution Approach 1:
The patent merges the transfer systems into a single shared mechanism that serves both wet and dry processing. This unified transfer system reduces complexity by eliminating redundant components while maintaining reliable substrate transfer through centralized control and standardized interfaces.
Solution Approach 2:
The shared stage acts as an intermediary between wet and dry processing systems. It provides a common interface that simplifies the transfer mechanism design, allowing substrates to be moved between different processing environments through a single, well-defined transfer point rather than requiring direct connections between all components.
Data Source
AI summary
A substrate processing system that performs substrate processing includes: a first processing system having one of a wet processing apparatus and a dry processing apparatus; a second processing system having the other one of the wet processing apparatus and the dry processing apparatus, wherein the first processing system includes a common stage, which is common to the first processing system and the second processing system and is configured to place thereon a container accommodating substrates before being subjected to the substrate processing, wherein the substrate processing system further includes: a first transfer system configured to transfer the substrates between the first processing system and the second processing system; and a second transfer system connected to at least the second processing system, and configured to transfer the substrates between the first processing system and the second processing system, or between another stage and the second processing system.