Second-Harmonic Patterned Polarization Confocal Microscopy
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Solution Overview
Problem
Existing microscopy techniques for collagen imaging suffer from low contrast, sensitivity, and specificity, making it difficult to distinguish between collagenous and noncollagenous regions.
Innovation Solution
A method and device for obtaining patterned microscopy images by generating a patterned mask based on a contrast-enhancing image, which is applied to a microscopy image to enhance contrast, utilizing optical signals from incoming beams and incorporating techniques like second-harmonic generation microscopy and polarization-analyzed reflection confocal microscopy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If existing microscopy techniques are used for collagen imaging, then the imaging process is simple, but the contrast and specificity are low making it difficult to distinguish between collagenous and noncollagenous regions
Solution Approach 1:
The patent combines multiple microscopy techniques (second-harmonic generation microscopy and polarization-analyzed reflection confocal microscopy) into a single integrated imaging system. This merging allows simultaneous acquisition of complementary information - SHG provides collagen-specific contrast while polarization analysis enhances structural orientation details - thereby improving measurement precision without requiring separate imaging experiments
Solution Approach 2:
The imaging system is designed to perform multiple functions using a unified platform. It can simultaneously execute SHG imaging for collagen detection, polarization analysis for structural characterization, and patterned mask processing for contrast enhancement. This multi-functionality achieves high contrast and specificity while avoiding the need for multiple separate microscopy systems
2Measurement precision
If multiple imaging techniques are combined to enhance contrast, then the discrimination capability improves, but the device complexity and processing time increase
Solution Approach 1:
The system performs preliminary image acquisition using SHG microscopy to generate a mask image that highlights collagen regions before applying the full polarization analysis and patterned mask processing. This preliminary action creates a guide image that directs subsequent processing steps, enabling the system to achieve high discrimination capability while reducing overall processing time by avoiding unnecessary analysis of non-collagenous regions
Solution Approach 2:
The patent applies different imaging and processing qualities to different regions of the sample. Using the SHG-generated mask, the system concentrates enhanced polarization analysis and patterned mask processing specifically on collagen-rich regions rather than uniformly processing the entire image. This local quality approach improves discrimination capability in relevant areas while reducing overall processing time by excluding non-collagenous regions from intensive processing
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides enhanced contrast and specificity in collagen imaging, allowing for accurate discrimination between collagenous and noncollagenous regions, and enables label-free, quantitative analysis of collagen fibers and their surrounding environment.
Implementation Method 1
incorporating techniques like second-harmonic generation microscopy and polarization-analyzed reflection confocal microscopy
Implementation Method 2
polarization-analyzed reflection confocal microscopy
Data Source
AI summary
The disclosure is directed to a method and apparatus for performing patterned microscopy. The method includes obtaining a microscopy image of an object based on optical signal from the object in response to a first incoming optical beam; and obtaining a contrast-enhancing image based on optical signal from the object in response to a second incoming optical beam. The method also includes generating a patterned mask based on the contrast-enhancing image. The method further includes applying the patterned mask on the microscopy image to obtain a patterned microscopy image. The microscopy image includes a polarization-analyzed reflection confocal microscopy image. The contrast-enhancing image includes a second-harmonic generation microscopy image. The patterned microscopy image includes a second-harmonic patterned polarization-analyzed reflection confocal microscopy image.