Shield Cover for EUV Plasma Pressure Wave Attenuation
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Solution Overview
Problem
In extreme ultraviolet light generation systems, the generation of plasma by irradiating a target with a pulse laser beam causes variations in the target trajectory due to pressure waves, leading to instability in EUV light production and potential interruptions in EUV light generation.
Innovation Solution
A shield cover is placed between the target detection region and the target supply device, featuring a through-hole to allow targets to pass through while reducing pressure waves that reach the target supply device, thereby stabilizing the target trajectory and maintaining consistent EUV light generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If a shield cover is added to reduce pressure waves, then target trajectory stability is improved, but device complexity increases
Solution Approach 1:
A shield cover is introduced as an intermediary component between the plasma generation region and the target supply device. The shield cover includes a through-hole that allows targets to pass through while blocking pressure waves from reaching the target supply device, thus stabilizing the target trajectory without requiring complex active control systems
Solution Approach 2:
The shield cover is designed with a through-hole that segments the structure into two functional zones: an upstream region that blocks pressure waves from reaching the target supply device, and a downstream region that allows targets to pass through to the plasma generation region. This segmentation enables the shield to perform multiple functions with a single component
2Reliability
If the target supply device is protected from pressure waves, then EUV light generation stability is improved, but the structure becomes more complex
Solution Approach 1:
The shield cover serves as a passive intermediary structure that protects the target supply device from pressure wave interference. By positioning the shield cover between the plasma generation region and the target supply device, the system achieves reliable EUV light generation without requiring complex active protection mechanisms
Solution Approach 2:
The harmful pressure waves are extracted or isolated from the target supply device region by the shield cover. The shield cover's through-hole allows targets to pass through while extracting the pressure waves from the path to the target supply device, thereby protecting the system and ensuring stable operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The shield cover effectively attenuates pressure waves, reducing target trajectory variations and ensuring stable EUV light generation by preventing vibration of the target supply device, thus ensuring synchronized pulse laser beam targeting and continuous EUV light production.
Implementation Method 1
a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region
Implementation Method 2
generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma
Data Source
AI summary
An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.